Abstract
Mutual diffusion is investigated in the Ti-V-Nb system at 1000 and 1200°C. A computation is performed by the Matano-Kirkaldy method for 89 points of an isothermal section at 1200°C and 101 points at 1000°C. Niobium was selected as solvent. It is found that the diagonal mutual diffusion coefficients grow by almost two orders as the composition approaches the titanium angle. Nondiagonal coefficients take on both positive and negative values.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
Literature cited
J. S. Kirkaldy and J. E. Lane, Can. J. Phys.,44, 2059 (1966).
A. P. Mokrov and V. K. Akimov, in: Diffusion Processes in Metals [in Russian], Tula Polytechnic Institute, Tula (1974), pp. 28–39.
Yu. É. Ugaste and Yu. A. Zaikin, Fiz. Met. Metalloved., No. 3, 567 (1975).
Author information
Authors and Affiliations
Additional information
Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 86–91, October, 1985.
Rights and permissions
About this article
Cite this article
Aitbaev, B.K., Gryzunov, V.I. & Sokolovskaya, E.M. Mutual diffusion in the titanium-vanadium-niobium system. Soviet Physics Journal 28, 841–845 (1985). https://doi.org/10.1007/BF00897962
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF00897962