Conclusions
From our investigations it follows that the dependence of the tellurium capture rate on supersaturation in the GaAs(Te)-ASCl3-H2 system can be explained:
-
a)
in the region of low supersaturations, on the basis of the surface-diffusion model withλ si λ s0<1 on (111)B andλ si/λ s0>1 on (111)A;
-
b)
in the region of high supersaturations, on the basis of a model that takes account of the decrease in the density of sites of impurity-atom incorporation into a step because of contamination of the contamination of the steps with chlorine.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 6, pp. 42–46, June, 1983.
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Lavrent'eva, L.G., Vilisova, M.D. & Moskovkin, V.A. Kinetics of capture of tellurium by {111} gallium arsenide faces in the GaAs-AsCl3-H2 system at various supersaturations. Soviet Physics Journal 26, 536–540 (1983). https://doi.org/10.1007/BF00891925
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DOI: https://doi.org/10.1007/BF00891925