Abstract
The analytical conditions for obtaining uniform films deposited from vapor-gas phase in a laminar-isothermal flow are determined.
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V. P. Popov and O. S. Rabinovich, Elektron. Tekh., Mater., No. 6, 68–72 (1979).
E. P. Prokop'ev and A. A. Fokina, Elektron. Tekh., Mater., No. 3, 53–56 (1980).
E. Jahnke, F. Emde, and F. Lesh, Special Functions [Russian translation], Mir, Moscow (1977), pp. 245–284.
E. Grey and G. B. Mathews, Bessel Functions and Their Application to Physics and Mechanics [Russian translation], Moscow (1953).
B. A. Joyce and R. R. Bradley, J. Electrochem. Soc.,110, No. 12, 1235–1240 (1963).
R. Reid, J. M. Prausnitz, and T. Sherwood, Properties of Gases and Liquids [Russian translation], Leningrad (1982).
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Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 52, No. 3, pp. 405–409, March, 1987.
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Georgiev, G.I., Karbanov, S.G. & Peev, G.A. Approximate model of the deposition of thin films from vapor-gas phase in a tubular diffusion furnace. Journal of Engineering Physics 52, 294–297 (1987). https://doi.org/10.1007/BF00872509
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DOI: https://doi.org/10.1007/BF00872509