Spectroscopic investigation of the reaction of oxides with metallic surfaces

Conclusions

• 1. A spectroscopic study was made of the reactions of several metals (Al, Cu, Ni, Co, Ti, Mo, W, and Kh18N9T steel) with silicon dioxide in the as-deposited condition and after annealing in the temperature range 600–1500°C.

• 2. In the contact reaction of SiO₂ films with metallic surfaces up to the maximum temperatures of existence of these films, no individual metallic oxides or similar chemical compounds (such as olivines) are formed.

• 3. The temperature limits of stability of SiO₂ films applied to various metallic substrates have been established. The most stable systems, remaining unchanged right up to 1450°C, are Mo-SiO₂ and W-SiO₂.

• 4. The reaction in metal-SiO₂ film systems at temperatures below the film stability limits is limited to a polarizing action of the metallic substrate, which manifests itself in the appearance of additional absorption bands in the ranges 1320–1260 and 520–500 cm⁻¹.