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Review: Sputtering mechanisms for amorphous and polycrystalline solids

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Abstract

In this article the latest developments in the theory of sputtering of amorphous and polycrystalline targets are reviewed and comparison is made with available experimental data. Special attention is given to differences in the various theoretical approaches to the sputtering yield problem and the conclusions derived therefrom.

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Authors and Affiliations

  1. Department of Physics, University of Essex, Colchester, UK

    I. S. T. Tsong & D. J. Barber

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  1. I. S. T. Tsong
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  2. D. J. Barber
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Tsong, I.S.T., Barber, D.J. Review: Sputtering mechanisms for amorphous and polycrystalline solids. J Mater Sci 8, 123–135 (1973). https://doi.org/10.1007/BF00755591

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  • DOI: https://doi.org/10.1007/BF00755591

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