Abstract
Oxidation kinetics of Ti-1 wt. % Si and Ti-5 wt. % Si alloys in either pure oxygen or air under a pressure of 0.93 bar and in the temperature range of 1171–1473 K are reported. For the exposure period investigated (up to 12 h) both alloys oxidized slower than pure Ti. The amount of oxygen dissolved in the Ti-1 wt. % Si alloy has been calculated. X-ray diffraction analyses indicate that the oxide scale is mainly TiO 2 ,except for the Ti-5 wt. % Si alloy oxidized at 1473 K where some evidence of SiO 2 was obtained. Hardness profiles were taken across the Ti-1 wt. % Si alloy matrix.
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Rosa, C.J. Oxidation of Ti-1Si and Ti-5Si alloys. Oxid Met 17, 359–369 (1982). https://doi.org/10.1007/BF00742117
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DOI: https://doi.org/10.1007/BF00742117