Literature cited
Investigation of Rock Masses by Photoelastic Methods [in Russian], Moscow (1982).
Photoelastic Method [in Russian], Vol. 1, Moscow (1975).
E. N. Filimonova, “Method of investigating stresses on three-dimensional transparent models of optically insensitive material with optically sensitive insets,” Author's Abstract of Candidate's Dissertation, Moscow (1969).
Stresses and Strains in Machine Parts and Components [in Russian], Moscow (1961).
W. Kuhn and T. Grun, Kolloid.-Z., Bd 101, 248–251 (1942).
V. N. Tsvetkov, V. E. Éskin, and S. Ya. Frenkel', Structure of Macromolecules in Solutions [in Russian], Moscow (1964).
N. I. Malkis, V. G. Vasil'ev, L. Z. Rogovina, and V. F. Trumbachev, “Properties and technology of manufacturing SKTN-base material for the photoelastic method,” Fiz.-Tekh. Probl. Razrab. Polezn. Iskop., No. 1, 104–107 (1981).
L. Z. Rogovina, A. S. Shapatin, N. I. Malkis, V. G. Vasil'ev, R. F. Markina, N. P. Isaeva, L. I. Komarova, V. F. Trumbachev, and G. K. Slonimskii, “Low-modulus dimethyldiphenyl-siloxane-base materials and the possibility of their use for modeling the stress state by the photoelastic method,” Fiz.-Tekh. Probl. Razrab. Polezn. Iskop., No. 4, 107–111 (1983).
N. I. Malkis, L. Z. Rogovina, G. L. Slonimskii, V. G. Vail'ev, V. F. Trumbachev, O. K. Slavin, A. S. Shapatin, R. F. Markina, and N. G. Isaeva, “Materials of models for investigating the stress-strain state of objects by the photoelastic method,” USSR Patent No. 958850, Otkr. Izobret. Prom. Obraztsy. Tov. Zn., No. 34, 188 (1982),
K. A. Andrianov, V. M. Kopylov, A. S. Shapatin, L. V. Kireeva, A. A. Vyaz'mitinova, É. I. Khubulava, L. M. Khananashvili, and E. M. Muzovskaya, “Method of producing α,ω-dihyroxy-diorganooligosiloxanes,” USSR Patent No. 726122, Otkr. Izobret. Prom. Obraztsy. Tovarn. Znaki, No. 13, 134–135 (1980).
A. A. Askadskii and Yu. I. Matveev, Chemical Structure and Physical Properties of Polymers [in Russian], Moscow (1983).
Author information
Authors and Affiliations
Additional information
Translated from Mekhanika Kompozitnykh Materialov, No. 4, pp. 724–729, July–August, 1986
Rights and permissions
About this article
Cite this article
Malkis, N.I., Rogovina, L.Z., Vasil'ev, V.G. et al. Low-modulus siloxane-base composite models and possibility of using them in the photoelastic method. Mech Compos Mater 22, 517–521 (1987). https://doi.org/10.1007/BF00692268
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF00692268