Abstract
The experimental results obtained by the investigation of stimulated FIR emission from dopedp-type germanium andp-type silicon by hot holes in crossedE andH fields atТ = 10 and 80 K are reported. The analysis of the emission intensity fromp-type germanium as a function ofE andH fields permits us to draw a conclusion about the important role of quantization of the energy spectrum of light holes and the contribution of light hole transitions with Δn = 2 to the amplification of FIR radiation. A new region of generation is demonstrated inp-type germanium under uniaxial stress. The first experimental results on stimulated FIR emission fromp-type silicon are reported.
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Vorobjev, L.E., Danilov, S.N. & Stafeev, V.I. Generation of far-infrared radiation by hot holes in germanium and silicon inE ⊥H fields. Opt Quant Electron 23, S221–S229 (1991). https://doi.org/10.1007/BF00619769
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DOI: https://doi.org/10.1007/BF00619769