Abstract
The resistivity increase of very thin metal films during gas adsorption is stronger than predicted by the commond −1 law. This effect is contributed to surface roughness. A quantitative theory is presented which leads to an additionald −3 term. The theory is checked using literature data obtained for the Ag/O2 system.
Similar content being viewed by others
References
E.H. Sondheimer: Adv. Phys.1, 1 (1952)
P. Wißmann:Springer Tracts Mod. Phys. 77, 1 (1975)
E.C. Crittenden, R.W. Hoffman: J. Phys. Radium17, 220 (1956)
J.M. Ziman:Electrons and Phonons (Clarendon Press, Oxford 1963) p. 459
S.B. Soffer: J. Appl. Phys.38, 1710 (1967)
Y. Namba: Japan. J. Appl. Phys.9, 1326 (1970)
K.C. Elsom, J.R. Sambles: J. Phys.F11, 647 (1981)
H. Hoffmann: InFestkörperprobleme, Advances in Solid State Physics 22, 259 (Vieweg, Braunschweig 1981)
K.M. Leung: Phys. Rev.B30, 647 (1984)
A.R. McGurn, A.A. Maradudin: Phys. Rev.B30, 3136 (1984)
H.-U. Finzel, P. Wißmann: Ann. Physik43, 5 (1986)
E. Schmiedl, M. Watanabe, P. Wißmann, E. Wittmann: Appl. Phys.A35, 13 (1984)
E. Schmiedl, M. Watanabe, P. Wißmann, E. Wittmann: Z. Phys. Chem. (Frankfurt) (in press)
G. Wedler, H. Reichenberger, H. Wenzel: Z. Naturforsch.26a, 1452 (1971)
G. Wedler, W. Wiebauer: Thin Solid Films28, 65 (1975)
G. Wedler, M. Fouad: Z. Phys. Chem. (Frankfurt)40, 12 (1964)
D. Dayal, H.-U. Finzel, P. Wißmann: InChemisorption of Gases on Metal Films, ed. by P. Wißmann (Elsevier, Amsterdam) (in press)
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Finzel, H.U., Schmiedl, E. & Wißmann, P. The effect of surface roughness on the resistivity increase of thin metal films during gas adsorption. Appl. Phys. A 42, 87–90 (1987). https://doi.org/10.1007/BF00618162
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00618162