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Ion energies at the cathode of the DC planar magnetron sputtering discharge

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Abstract

The energy distribution of the ions striking the cathode of the dc planar magnetron system was measured over a range of the typical sputtering conditions (magnetic field of 0.07–0.13 T, argon pressure of 0.01–10 Pa, discharge voltage of 250–600 V). The results obtained allow us to conclude that the major part of the incident ion flux originates in the cathode fall region. The theoretical model developed in terms of mobility theory makes it possible to evaluate the cathode fall voltage and its dependence on the sputtering conditions. It was found that the normalized integral form of the incident ions, energy spectrum is practically independent of the sputtering discharge parameters.

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Authors and Affiliations

  1. Centre for Technical Progress, 1b M. Buczka St., PL-40-955, Katowice, Poland

    D. Czekaj

  2. V. I. Ulyanov (Lenin) Electrical Engineering Institute, 5 Prof. Popova St., SU-197022, Leningrad, USSR

    E. K. Hollmann, A. B. Kozirev, V. A. Volpyas & A. G. Zaytsev

Authors
  1. D. Czekaj
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  2. E. K. Hollmann
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  3. A. B. Kozirev
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  4. V. A. Volpyas
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  5. A. G. Zaytsev
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Czekaj, D., Hollmann, E.K., Kozirev, A.B. et al. Ion energies at the cathode of the DC planar magnetron sputtering discharge. Appl. Phys. A 49, 269–272 (1989). https://doi.org/10.1007/BF00616853

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  • DOI: https://doi.org/10.1007/BF00616853

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