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The effect of silicon and manganese on the oxidation mechanism of Ni-20 Cr

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Abstract

Additions of 3% silicon or manganese to Ni-20 Cr reduced the oxidation rate, whereas additions of 1% had little effect. Three percent silicon alloys formed an inner scale of SiO2, and 3% manganese alloys formed an inner spinel layer of essentially pure MnCr2O4. The experimentally determined solid-state growth rate of NiCr2O4 was about 1000 times slower than the growth rate for Cr2O3. It has been established that the protective layer on Ni-20 Cr (Nichrome alloys) is the spinel and not Cr2O3 as previously postulated. The mechanism for scale growth is discussed for Ni-20 Cr alloys.

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Authors and Affiliations

  1. University of California, Los Angeles, California

    D. L. Douglass

  2. General Electric Co., San Jose, California

    J. S. Armijo

Authors
  1. D. L. Douglass
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  2. J. S. Armijo
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Additional information

This work was performed at Stanford Research Institute, Menlo Park, Calif. and was supported by the National Aeronautics amd Space Administration, Contract NAS 3-11165.

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Douglass, D.L., Armijo, J.S. The effect of silicon and manganese on the oxidation mechanism of Ni-20 Cr. Oxid Met 2, 207–231 (1970). https://doi.org/10.1007/BF00603657

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  • DOI: https://doi.org/10.1007/BF00603657

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