Abstract
The chemical relaxation technique consists of measuring the response of a chemical system to a small disturbance of an equilibrium or a nonequilibrium steady state. Since, for a small perturbation, the response of any complex and stable system is linear, rate constants of elementary processes under actual plasma conditions can be evaluated directly from the relaxation data. Applications of this technique to the kinetic study of the formation and decomposition of silane are presented and compared with previous data obtained by a flow method. In addition, relaxation data are presented which show that the main reaction channel of silance decomposition in glow discharges is the electron-impact-induced fragmentation into SiH2 radicals (or ions) and H2 molecules.
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Wagner, J.J., Vepřek, S. Chemical relaxation study of the heterogeneous silicon-hydrogen system under plasma conditions. Plasma Chem Plasma Process 3, 219–234 (1983). https://doi.org/10.1007/BF00566021
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DOI: https://doi.org/10.1007/BF00566021