Abstract
A theoretical model has been developed to describe the deposition of polymer occurring in a capacitatively coupled, low-pressure, RF discharge sustained in ethane. The reaction mechanism chosen for this model assumes that polymer formation is controlled by the formation of free radicals in the plasma and the subsequent reaction of these species at the surface of the electrodes used to sustain the plasma. Convective and diffusive transport is taken to occur in the direction parallel to the electrodes. Diffusive transport perpendicular to the electrodes is considered to be rapid, and hence the gradients in this direction are taken to be negligible. Both the composition of the gas leaving the plasma reactor and the axial profile of polymer deposition rate within the reactor, observed experimentally, are predicted accurately by the model. Results obtained from the model have also been used to estimate the kinetic chain length and degree of unsaturation in the polymer. Both predictions are found to be in reasonable agreement with experimental observations.
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V. M. Kolotyrkin, A. B. Gilman, and A. K. Tsqpuk,Russ. Chem. Rev. 36, 579 (1967).
A. M. Mearns,Thin Solid Films 3, 201 (1969).
M. Millard, inTechniques and Applications of Plasma Chemistry, J. R. Hollahan and A. T. Bell, eds., Wiley, New York (1974).
M. Shen, ed.,Plasma Chemistry of Polymers, Marcel Dekker, New York (1976).
M. R. Havens, M. E. Biolsi, and K. G. Mayhan,J. Vac. Sci. Technol. 13, 575 (1976).
H. Yasuda, inThin Film Processes, J. L. Vossen, and W. Kern, eds., Academic Press, New York (1978).
M. Shen and A. T. Bell, inPlasma Polymerization, ACS Symposium Series 108, M. Shen and A. T. Bell, eds., American Chemical Society, Washington, D.C. (1979).
A. T. Bell, inPlasma Chemistry III, Topics in Current Chemistry, Vol. 94, S. Vepřek and M. Venugopalan, eds., Springer-Verlag, Berlin, New York (1980).
R. J. Jensen, A. T. Bell, and D. S. Soong,Plasma Chem. Plasma Process.3, 139 (1983).
J. G. Calvert and J. N. Pitts, Jr.,Photochemistry, Wiley, New York (1966).
S. G. Lias, G. H. Collin, R. E. Rebbert, and P. Ausloos,J. Chem. Phys. 52, 1841 (1970).
H. Akimoto, K. Obi, and I. Tanaka,Bull. Chem. Soc. Jpn. 46, 2267 (1973).
L. W. Sieck, inFundamental Processes in Radiation Chemistry, P. Ausloos, ed., Wiley, New York (1968).
P. Borrell A. Cervenka and J. W. Turner,J. Chem. Soc. (B), 2294 (1971).
H. Hara, K. Kodama, and I. Tanaka,Bull. Chem. Soc. Jpn. 48, 711 (1975).
E. L. Cochran, F. J. Adrian, and V. A. Bowers,J. Chem. Phys. 40, 213 (1964).
S. Takita, Y. Mori, and I. Tanaka,J. Phys. Chem. 73, 2929 (1969).
L. J. Stief, V. J. DeCaro, and R. J. Matloni,J. Chem. Phys. 42, 3113 (1965).
M. Tsukada and S. Shida,Bull. Chem. Soc. Jpn. 43, 3621 (1970).
H. Kobayashi, A. T. Bell, and M. Shen,Macromolecules 7, 277 (1974).
H. G. PooleProc. R. Soc. London (A),163, 404, 415, 424 (1937).
Desaintfuscien,Rev. Phys. Appl. 2, 235 (1967).
T. M. Shaw, Studies of Microwave Gas Discharges: Production of Free Radicals in a Microwave Discharge, General Electric Technical Information Report No. TISR58ELM 115, General Electric Microwave Laboratory, Palo Alto, California (1958).
B. H. Mayhan and R. Mandal,J. Chem. Phys. 37, 207 (1962).
P. Ausloos, R. Gorden, Jr., and S. G. Lias,J. Chem. Phys. 40, 1854 (1964).
H. Okabe and R. J. McNesby,J. Chem. Phys. 37, 1340 (1962).
M. C. Sauer, Jr., and L. M. Dorfman,J. Chem. Phys. 39, 2549 (1963).
H. Okabe and D. A. Becker,J. Chem. Phys. 39, 2549 (1963).
V. N. Kondratiev, Rate Constants of Gas Phase Reactions, Office of Standard Reference Data, National Bureau of Standards, Washington, D.C. (1972).
A. A. Westenberg and N. DeHaas,J. Chem. Phys. 50, 707 (1969).
J. R. Barker, D. G. Keil, J. V. Michael, and D. T. Osborne,J. Chem. Phys. 52, 2079 (1970).
J. W. Michael and R. E. Seston, Jr.,J. Chem. Phys. 45, 3632 (1966).
T. Ibuki and Y. Takezaki,Bull. Chem. Soc. Jpn. 48, 769 (1975).
J. A. Cowfer, D. G. Keil, J. V. Michael, and C. Yeh,J. Phys. Chem. 75, 1584 (1971).
G. G. Volpi and F. Zocchi,J. Chem. Phys. 44, 4010 (1966).
J. V. Michael and H. Niki,J. Chem. Phys. 44, 4969 (1967).
V. S. Rabinovitch and D. S. Setser,Adv. Photochem. 3, 1 (1964).
J. O. Terry and J. H. Futrell,Can. J. Chem. 45, 2327 (1968).
S. Morita, M. Shen, and A. T. Bell,J. Polym. Sci.: Polym. Chem. Ed. 17, 2775 (1979).
P. Camilleri, R. M. Marshall, and J. H. Purnell,J. Chem. Soc. Faraday Trans. 1 70, 1434 (1970).
M. J. Kurylo, N. C. Peterson, and W. Brau,J. Chem. Phys. 53, 2776 (1970).
G. Pratt, and I. Veltman,J. Chem. Soc. Faraday Trans. 1 70, 1840 (1974).
G. Pratt and I. Veltman,J. Chem. Soc. Faraday Trans. 1 72, 1733 (1976).
L. Teng, and W. E. Jones,J. Chem. Soc. Faraday Trans. 1 68, 1267 (1972).
M. P. Halstead, D. A. Leathard, R. M. Marshall, and H. J. Purnell,Proc. R. Soc. London (A)316, 575 (1970).
G. L. Pratt,Gas Kinetics, Wiley, London (1969).
J. A. Kerr and A. F. Trotman-Dickenson, inProgress in Reaction Kinetics, Vol. 1, G. Porter, ed., Wiley, New York (1961).
J. Nicholas,Chemical Kinetics: A Modern Survey of Gas Reactions, Halstead Press, New York (1976).
L. Mandelcorn and E. W. R. Steacie,Can. J. Chem. 32, 474 (1954).
L. C. Landers and D. H. Volman,J. Am. Chem. Soc. 79, 2996 (1957).
J. A. Kerr and A. F. Trotman-Dickenson,J. Chem. Soc. (London), 1602, 1611 (1960).
J. A. Kerr and A. F. Trotman-Dickenson,Trans. Faraday Soc. 55, 572 (1959).
R. N. Birrell, and A. F. Trotman-Dickenson,J. Chem. Soc. (London), 4218 (1960).
J. A. Garcia Dominguez, and A. F. Trotman-Dickenson,J. Chem. Soc. (London), 940 (1962).
L. W. Watkins, and L. A. O'Deen,J. Phys. Chem. 65, 2665 (1971).
B. A. Thrush, inProgress in Reaction Kinetics, Vol. 3, G. Porter, ed., Pergamon, Oxford (1965).
K. Schofield,Planet. Space Sci. 15, 643 (1967).
S. W. Benson and G. R. Haugen,J. Phys. Chem. 71, 4404 (1967).
F. K. Truby,Int. J. Chem. Kinet. 5, 721 (1973).
O. Levenspiel and K. B. Bischoff, inAdvances in Chemical Engineering, Vol. 4, T. B. Drew, W. Hoopes, Jr., and T. Vermeulen, eds., Academic Press, New York (1963).
R. ArisProc. R. Soc. London (A)235, 67 (1956).
A. Bournia, J. Coull, and G., Houghton,Proc. R. Soc. London (A)261, 277 (1961).
R. B. Bird, W. E. Stewart, and E. N. Lightfoot,Transport Phenomena Wiley, New York (1960).
J. O. Hirschfelder, C. F. Curtis, and R. B. Bird,Molecular Theory of Gases and Liquids, Wiley, New York (1964).
J. Newman,Ind. Eng. Chem. Fundam. 7, 314 (1968).
W. Braun, A. M. Bass, and M. J. Pilling,J. Chem. Phys. 52, 5131 (1970).
A. H. Laufer, and A. M. Bass,J. Phys. Chem. 79, 1635 (1975).
M. J. Pilling, and J. A. Robertson,Chem. Phys. Lett. 33, 336 (1975).
A. T. Bell, inTechniques and Applications of Plasma Chemistry, J. R. Hollahan and A. T. Bell, eds., Wiley, New York (1974).
J. M. Tibbitt, R. Jensen, A. T. Bell, and M. Shen,Macromolecules 10, 647 (1977).
B. J. Wood and H. Wise,J. Phys. Chem. 65, 1049 (1962).
J. J. Ahumada, and J. V. Michael,J. Phys. Chem. 78, 465 (1974).
A. Mandl, and A. Salop,J. Phys. Chem. 67, 1163 (1963).
A. B. King and H. Wise,J. Phys. Chem. 67, 1163 (1963).
K. H. Laidler, inCatalysis, P. H. Emmett, ed., Reinhold, New York (1954).
T. R. Marrero and E. A. Mason,J. Phys. Chem. Ref. Data 1, 3 (1972).
J. M. Tibbitt, A. T. Bell, and M. Shen,J. Macromol. Sci.-Chem. A11, 139 (1977).
A. Dilks, S. Kaplan, and A. Van Laeken,J. Polym. Sci.: Polym. Chem. Ed. 19, 2987 (1981).
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Jensen, R.J., Bell, A.T. & Soong, D.S. Plasma polymerization of ethane. II. Theoretical analysis of effluent gas composition and polymer deposition rates. Plasma Chem Plasma Process 3, 163–192 (1983). https://doi.org/10.1007/BF00566019
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DOI: https://doi.org/10.1007/BF00566019