Abstract
A series of fluorocarbon gases, viz., CF4, C2F6, C3F8, and CHF3, have been compared for their relative tendencies to deposit polymeric material onto various surfaces, including Si and SiO2, under RF plasma conditions. The plasmas were examined by optical emission spectroscopy. C3F8 and CHF3 were found to produce the highest yields of polymers, although these exhibited significant differences in structure (as shown by XPS and IR) and differences in thermal stability, both of which could be minimized by replacing the C3F8 gas with a C3F8/H2 mixture. The polymers produced from CHF3 under the conditions of the present study were found to accumulate preferentially onto Si rather than SiO2, as verified by the technique of Rutherford backscattering spectrometry.
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Astell-Burt, P.J., Cairns, J.A., Cheetham, A.K. et al. A study of the deposition of polymeric material onto surfaces from fluorocarbon RF plasmas. Plasma Chem Plasma Process 6, 417–427 (1986). https://doi.org/10.1007/BF00565553
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DOI: https://doi.org/10.1007/BF00565553