Abstract
The sequence of structural-phase changes in the surface layer of molybdenum during pulsed implantation of N+, C+, and Si+ ions has been studied. At radiation doses ≲5·1016 cm−2 we detected qualitatively similar structural-phase transformations with the formation of highly dispersed secondary-phase particles (nitrides, carbides, and silicides), dislocations, point defects, and clusters of defects. At radiation doses (1–2)·1017 cm−2 implantation of C+ and Si+ ions causes amorphization of the surface layer; nitrogen implantation is accompanied by the formation of continuous layers of the nitride phase on the surface.
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Siberian Physicotechnical Institute at the V. D. Kuznetsov State University, Tomsk. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 2, pp. 3–9, February, 1994.
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Korotaev, A.D., Bekhert, A.É., Tyumentsev, A.N. et al. Sequence of structural-phase states during implantation of C+, N+, and Si+ ions into molybdenum. Russ Phys J 37, 109–114 (1994). https://doi.org/10.1007/BF00559054
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DOI: https://doi.org/10.1007/BF00559054