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Some properties of electron beam evaporated amorphous Mo-N films

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Abstract

A series of amorphous Mo-N films was prepared by electron beam evaporation of molybdenum in varying partial pressures of nitrogen and deposited onto substrates cooled to about 80 K. The alloy films were characterized by X-ray diffraction, the superconducting transition temperature,T c, and the crystallization temperature,T x. The maximumT c (8.3 K) and sharpest transition occurred with the minimum nitrogen pressure necessary to form the amorphous structure, as revealed by X-ray diffraction. After annealing the as-deposited films, both bcc and fcc phases were found with the bcc/fcc ratio decreasing with increasing nitrogen partial pressure. Differential scanning calorimetry (DSC) measurements showed significant differences in the shape of peaks associated with either bcc, bcc+fcc, or fcc phases. The temperature,T x, associated with the fcc crystallization increased with nitrogen content. Heats of crystallization had an average value of about 63 J g−1. Changes in position of the first amorphous X-ray diffraction peak showed that the amorphous structure was expanded by increasing nitrogen content.

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Research sponsored by the Division of Materials Sciences, US Department of Energy under contract W-7405-eng-26 with the Union Carbide Corporation.

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Easton, D.S., Henninger, E.H., Cavin, O.B. et al. Some properties of electron beam evaporated amorphous Mo-N films. J Mater Sci 18, 2126–2134 (1983). https://doi.org/10.1007/BF00555007

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