Abstract
The modified chemical vapour deposition (MCVD) process for making fibre optic preforms uses direct oxidation of SiCl4, together with dopant chlorides to produce core glass. This reaction has been studied by direct infra-red absorption spectrophotometry of the flowing gas system. The spectrum of the SiCl4 reactant is recognizable, its decrease with increasing temperature was measured, and the absorption spectra of SiO2 and of silicon oxychloride reaction products were recognized in the flowing gas stream. The oxychlorides began to appear in the spectra at 900° C and increased with temperature to 1110° C. Their concentration decreased drastically between 1110° C and 1160° C above which only the spectrum of SiO2 was observed. The identities of the oxychloride molecular species produced are uncertain, but small amounts of Si2OCl6 and the cyclic Si4O4Cl8 were present together with several unidentified higher molecular weight compounds. The particulate matter formed in the MCVD process shows infra-red spectra varying with conditions of formation. At temperatures below 1160° C the particulate matter shows absorption bands attributable to silicon oxychlorides. At higher temperatures, the particulate matter is free of oxychloride bands and shows only the proper SiO2 spectrum. If moisture is present, these spectra are modified.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
J. B. Macchesney, P. B. O'Connor and H. M. Presby, Proc. IEEE 62 (1974) 1280.
G. Friedel and E. Ladenburg, Compt. Rend. 66 (1868) 539.
H. Rheinboldt and W. Wisfeld, Amer. Chem. 517 (1935) 197.
W. R. Sinclair, J. B. Macchesney, P. K. Gallagher and P. B. O'Connor, Thermochim. Acta (submitted for publication).
W. G. French and L. J. Pace, International Conference on Integrated Optics and Optical Communication, Tokyo, Japan (Institute of Electrical and Communications Engineers of Japan, Tokyo, 1977).
W. W. Pultz, French Patent No. 2 006 440 assigned to Corning Glass Co. (1969).
W. C. Schumb and R. A. Lefever, J. Amer. Chem. Soc. 76 (1954) 2091.
D. W. S. Chambers and C. J. Wilkins, J. Chem. Soc. (1960) 5088.
A. N. Lazarev, M. G. Voronkov and T. F. Tenisheva, Opt. i. Spektroskopia 5 (1958) 365.
J. R. Durig and K. L. Hellams, Inorg. Chem. 8 (1969) 944.
J. E. Griffiths and D. F. Sturman, Spectrochim. Acta 25A (1969) 1415.
R. R. Haun and W. D. Harkins, J. Amer. Chem. Soc. 54 (1932) 3917.
D. A. Long, T. V. Spencer, D. N. Waters and L. A. Wood, Proc. Roy. Soc. (London) A240 (1957) 499.
F. Stitt and D. M. Yost, J. Chem. Phys. 5 (1937) 90.
M. Katayama, T. Shimanouchi, Y. Morino and S. Mizushia, J. Chem. Phys. 18 (1950) 506.
J. E. Griffiths, Spectrochim. Acta. 25A (1969) 965.
F. Hoefler, W. Savodny and E. Hengge, ibid. 26A (1970) 819.
J. E. Griffiths, ibid. 30A (1974) 945.
Y. Morino, J. Chem. Phys. 24 (1956) 164.
J. E. Griffiths, Spectrochim. Acta. 30A (1974) 169.
G. A. Ozin, J. Chem. Soc. A19 (1969) 2952.
A. E. Smith, “Analysis of Silicones” (J. Wiley & Sons, New York, 1974) p. 277.
L. J. Bellamy “Infra-red Spectra of Complex Molecules” (J. Wiley & Sons, New York, 1958) p. 279.
C. W. Young, P. C. Servais, C. C. Currie and M. J. Hunter, J. Amer. Chem. Soc. 70 (1948) 3758.
H. Bamford and C. F. H. Tupper, “Comprehensive Chemical Kinetics”, Vol. 6 (Elsevier, New York, 1949) 110.
F. A. Cotton and G. Wilkinson, “Advanced Inorganic Chemistry” (Interscience, New York, 1962) p. 356.
W. C. Schumb, Chem. Rev. 31 (1942) 587.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Wood, D.L., Macchesney, J.B. & Luongo, J.P. Investigation of the reactions of SiCl4 and O2 at elevated temperatures by infra-red spectroscopy. J Mater Sci 13, 1761–1768 (1978). https://doi.org/10.1007/BF00548739
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00548739