Skip to main content
SpringerLink
Log in

The study of plasma stability of poly(organophosphazene) films prepared on silicon wafers

  • Papers
  • Published:
Journal of Materials Science Aims and scope Submit manuscript

Abstract

Six poly(organophosphazenes) were prepared by the reaction between polydichlorophosphazene and alkoxides, phenoxides or amine compounds. The plasma stability of their films prepared on silicon wafers was investigated with an ellipsometer and ESCA; the plasma used was poly(bisanilinophosphazene) and the stability was similar to novolak resin.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. M. Kajiwara, J. Mater. Sci. 23 (1988) 1360.

    Google Scholar 

  2. Idem, Polymer 30 (1989) 1536.

    Google Scholar 

  3. S. H. Rose, J. Polym. Sci. B6 (1968) 837.

    Google Scholar 

  4. A. Wilson, Army Natick Laboratories, Technical Report TR 75-38-CE (1974).

  5. H. R. Allcock, R. W. Allen and J. P. Obrien, J. Chem. Soc. Chem. Commun. (1976) 717.

  6. H. Hiraoka, J. Vac. Sci. Technol. B5 (1987) 386.

    Google Scholar 

  7. H. Hiraoka, W. Y. Lee, L. W. Welsh. Jr and R. W. Allen, Macromol. 12 (1979) 753.

    Google Scholar 

  8. J. M. Shaw, M. Hatzakis, J. Liukus and E. Babich, Proceedings of the Technical Conference on Photopolymers Principles Processes and Materials (Mid-Hudson Section, Society Plastic Engineering Inc, 1982) p. 285.

  9. D. C. Hofer, R. D. Miller and C. G. Wilson, “Advances in Resist Technology”, Vol. 469 (SPIE, Washington, DC, 1984) p. 16.

    Google Scholar 

  10. H. Saito and M. Kajiwara, Kogyo Kagaku Zasshi. 66 (1963) 618.

    Google Scholar 

  11. M. Kajiwara and E. Miwa, Polymer 23 (1982) 495.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, 464, Nagoya, Japan

    Meisetsu Kajiwara

  2. Oki Electric Industry Co., 550-5, Higashiasakawa-cho, Hachioji-shi, 193, Tokyo, Japan

    Yoshio Yamashita

Authors
  1. Meisetsu Kajiwara
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Yoshio Yamashita
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Kajiwara, M., Yamashita, Y. The study of plasma stability of poly(organophosphazene) films prepared on silicon wafers. J Mater Sci 26, 2797–2804 (1991). https://doi.org/10.1007/BF00545572

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00545572

Keywords

Search

Navigation