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Application of ion-etching of grooves into quartz for surface acoustic wave devices

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Abstract

The application of r.f.-sputter etching techniques to the fabrication of grooves in the surface of quartz is reported. This process has been used for the construction of devices which employ the interaction of surface acoustic waves with arrays of well-defined parallel grooves. Devices have been produced with grooves up to 2.5 μm deep, which have substantially rectangular profiles and controllable mark-to-space ratios. The groove geometries have been characterized using Talysurf, optical microscopy, SEM and TEM techniques.

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Author notes

  1. B. Norris

    Present address: Rolls-Royce Ltd, Derby

Authors and Affiliations

  1. Hirst Research Centre, The General Electric Company, Wembley, UK

    R. J. Murray, B. Norris & B. P. Richards

Authors
  1. R. J. Murray
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  2. B. Norris
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  3. B. P. Richards
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Murray, R.J., Norris, B. & Richards, B.P. Application of ion-etching of grooves into quartz for surface acoustic wave devices. J Mater Sci 13, 2105–2108 (1978). https://doi.org/10.1007/BF00541663

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  • DOI: https://doi.org/10.1007/BF00541663

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