Abstract
The development of etch patterns of z-, y- and x-cut quartz plate is studied as a function of the specimen orientation. Plates of different cuts exhibit typical etch patterns satisfying either digonal or trigonal symmetry of α-quartz crystal. The changes of surface profilometry traces with depth of etch are also found to depend mainly on orientation dependence. The experimental data can be interpreted satisfactorily and consistently in terms of the structural reaction mechanism proposed by Ernsberger and in terms of the stability criterion. Some progress in the prediction of changes of etch figures with prolonged dissolution can thus be made by using some of the information reported in this paper.
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Tellier, C.R., Jouffroy, F. Orientation effects in chemical etching of quartz plates. J Mater Sci 18, 3621–3632 (1983). https://doi.org/10.1007/BF00540735
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DOI: https://doi.org/10.1007/BF00540735