Abstract
p-type ZnTe films were grown on a sputtered ZnO layer by using pulsed laser deposition in a nitrogen atmosphere. As the growth temperature was increased from 220 to 320 °C, hole concentrations in the ZnTe films decreased significantly from 1.3 × 1018 to 1.4 × 1016 cm−3 while the hole mobility increased slightly. The film growth at higher temperatures resulted in the loss of p-type behavior in the ZnTe films and on a deterioration in the film’s crystallinity. The degradation of crystal quality and p-type characteristics of ZnTe are most likely due to instable nitrogen bonding in ZnTe at high temperatures and to the large lattice mismatch of ∼25% between the ZnTe (111) and the ZnO (0001) crystal planes.
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Lee, S., Smith, D.B. & Xu, J. Characteristics of p-type ZnTe films grown on sputtered ZnO by using pulsed laser deposition. Journal of the Korean Physical Society 64, 461–464 (2014). https://doi.org/10.3938/jkps.64.461
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DOI: https://doi.org/10.3938/jkps.64.461