Abstract
The light doping behavior of boron in microwave plasma chemical vapor deposition diamond films by trace oxygen was investigated. As the oxygen concentration (O/C) increased from 0 to 5%, the growth rate of the diamond film first decreased and then increased. When oxygen was added during the diamond doping process, the suppression of boron doping and the improvement of crystal quality could be observed, and there was a significant suppression of residual nitrogen. Hall effect measurement results show that under the condition of O/C = 3%, high mobility and high quality diamond films can be obtained with a growth rate of 9 μm/h. This work shows that a trace amount of oxygen can compensate the crystal strain brought by boron doping and improve the crystal and surface quality. This technology can obtain high-quality and thick boron-doped diamond films with acceptable mobility, which are suitable for future advanced optoelectronic device applications.
Graphical abstract
Similar content being viewed by others
Data availability
The datasets generated during and/or analyzed during the current study are available from the corresponding author on reasonable request.
References
S. Imanishi, K. Horikawa, N. Oi et al., 3.8 W/mm RF power density for ALD Al2O3-based two-dimensional hole gas diamond MOSFET operating at saturation velocity. IEEE Electron Device Lett. 40(2), 279–282 (2018). https://doi.org/10.1109/LED.2018.2886596
Q. Wei, F. Lin, R. Wang et al., Heteroepitaxy growth of single crystal diamond on Ir/Pd/Al2O3 (11–20) substrate. Mater. Lett. 303, 130483 (2021). https://doi.org/10.1016/j.matlet.2021.130483
V.D. Blank, V.S. Bormashov, S.A. Tarelkin et al., Power high-voltage and fast response Schottky barrier diamond diodes. Diam. Relat. Mater. 57, 32–36 (2015). https://doi.org/10.1016/j.diamond.2015.01.005
A. Polyakov, N. Smirnov, S. Tarelkin et al., Electrical properties of diamond platinum vertical Schottky barrier diodes. Mater. Today: Proceed. 3, S159–S164 (2016). https://doi.org/10.1016/j.matpr.2016.02.027
M. Dutta, S. Mandal, R. Hathwar et al., Determination of minority carrier lifetime of holes in diamond pin diodes using reverse recovery method. IEEE Electron Device Lett. 39(4), 552–555 (2018). https://doi.org/10.1109/LED.2018.2804978
V. Mortet, J. Pernot, F. Jomard et al., Properties of boron-doped epitaxial diamond layers grown on (110) oriented single crystal substrates. Diam. Relat. Mater. 53, 29–34 (2015). https://doi.org/10.1016/j.diamond.2015.01.006
J. Barjon, E. Chikoidze, F. Jomard et al., Homoepitaxial boron - doped diamond with very low compensation. Physica Status Solidi (a) 209(9), 1750–1753 (2012). https://doi.org/10.1002/pssa.201200136
Z. Ma, C. Wu, J. Wang et al., Development of a plate-to-plate MPCVD reactor configuration for diamond synthesis. Diam. Relat. Mater. 66, 135–140 (2016). https://doi.org/10.1016/j.diamond.2016.04.008
Q. Liang, C.Y. Chin, J. Lai et al., Enhanced growth of high quality single crystal diamond by microwave plasma assisted chemical vapor deposition at high gas pressures. Appl. Phys. Lett. 94(2), 024103 (2009). https://doi.org/10.1063/1.3072352
E.V. Bushuev, V.Y. Yurov, A.P. Bolshakov et al., Synthesis of single crystal diamond by microwave plasma assisted chemical vapor deposition with in situ low-coherence interferometric control of growth rate. Diam. Relat. Mater. 66, 83–89 (2016). https://doi.org/10.1016/j.diamond.2016.03.023
S.N. Demlow, R. Rechenberg, T. Grotjohn, The effect of substrate temperature and growth rate on the doping efficiency of single crystal boron doped diamond. Diam. Relat. Mater. 49, 19–24 (2014). https://doi.org/10.1016/j.diamond.2014.06.006
P.N. Volpe, J. Pernot, P. Muret et al., High hole mobility in boron doped diamond for power device applications. Appl. Phys. Lett. (2009). https://doi.org/10.1063/1.3086397
S. Imanishi, K. Kudara, H. Ishiwata et al., Drain current density over 1.1 A/mm in 2D hole gas diamond MOSFETs with regrown p++-diamond ohmic contacts. IEEE Electron Device Lett. 42(2), 204–207 (2020). https://doi.org/10.1109/LED.2020.3047522
L.C. Hao, Y. Shen, X.D. Yang et al., Tailoring of nitrogen-vacancy colour centers in diamond epilayers by in situ sulfur and nitrogen anion engineering. J. Phys. D Appl. Phys. (2019). https://doi.org/10.1088/1361-6463/ab5908
D.Y. Liu, L.C. Hao, Z.A. Chen et al., Sulfur regulation of boron doping and growth behavior for high-quality diamond in microwave plasma chemical vapor deposition. Appl. Phys. Lett. (2020). https://doi.org/10.1063/5.0009615
R. Issaoui, A. Tallaire, A. Mrad et al., Defect and threading dislocations in single crystal diamond: a focus on boron and nitrogen codoping. Physica Status Solidi (a) 216(21), 1900581 (2019). https://doi.org/10.1002/pssa.201900581
R. Issaoui, J. Achard, L. William et al., Thick and widened high quality heavily boron doped diamond single crystals synthetized with high oxygen flow under high microwave power regime. Diam. Relat. Mater. 94, 88–91 (2019). https://doi.org/10.1016/j.diamond.2019.03.001
K. Fan, K. Tang, M. Zhang et al., The boron-phosphorous co-doping scheme for possible n-type diamond from first principles. Comput. Mater. Sci. 222, 112113 (2023). https://doi.org/10.1016/j.commatsci.2023.112113
T. Teraji, High-quality and high-purity homoepitaxial diamond (100) film growth under high oxygen concentration condition. J. Appl. Phys. (2015). https://doi.org/10.1063/1.4929962
L.C. Hao, Z.A. Chen, D.Y. Liu et al., Suppression and compensation effect of oxygen on the behavior of heavily boron-doped diamond films. Chin. Phys. B 32(3), 038101 (2023). https://doi.org/10.1088/1674-1056/ac7f8a
S.A. Bogdanov, A.L. Vikharev, M.N. Drozdov et al., Synthesis of thick and high-quality homoepitaxial diamond with high boron doping level: Oxygen effect. Diam. Relat. Mater. 74, 59–64 (2017). https://doi.org/10.1016/j.diamond.2017.02.004
M. Zhang, K. Tang, K. Wu et al., First principles investigation on the boron-oxygen complexes in diamond. Comput. Mater. Sci. 216, 111867 (2023). https://doi.org/10.1016/j.commatsci.2022.111867
R. Wang, B. Peng, H. Bai et al., Morphology, defects and electrical properties of boron-doped single crystal diamond under various oxygen concentration. Mater. Lett. 322, 132345 (2022). https://doi.org/10.1016/j.matlet.2022.132345
P.N. Volpe, J.C. Arnault, N. Tranchant et al., Boron incorporation issues in diamond when TMB is used as precursor: toward extreme doping levels. Diam. Relat. Mater. 22, 136–141 (2012). https://doi.org/10.1016/j.diamond.2011.12.019
M. Frenklach, H. Wang, Detailed surface and gas-phase chemical kinetics of diamond deposition. Phys. Rev. B 43(2), 1520 (1991). https://doi.org/10.1103/PhysRevB.43.1520
P.K. Bachmann, D. Leers, H. Lydtin, Towards a general concept of diamond chemical vapour deposition. Diam. Relat. Mater. 1(1), 1–12 (1991). https://doi.org/10.1016/0925-9635(91)90005-U
T. Tachibana, Y. Yokota, K. Hayashi et al., Growth of polycrystalline diamond films including diborane and oxygen in the source gas. J. Electrochem. Soc. 146(5), 1996 (1999). https://doi.org/10.1149/1.1391879
A. Fiori, T. Teraji, Plasma etching phenomena in heavily boron-doped diamond growth. Diam. Relat. Mater. 76, 38–43 (2017). https://doi.org/10.1016/j.diamond.2017.04.007
N. Lee, A. Badzian, A study on surface morphologies of (001) homoepitaxial diamond films. Diam. Relat. Mater. 6(1), 130–145 (1997). https://doi.org/10.1016/S0925-9635(96)00698-X
A.A. Chernov, Growth kinetics and capture of impurities during gas phase crystallization. J. Cryst. Growth 42, 55–76 (1977). https://doi.org/10.1016/0022-0248(77)90178-6
T. Ando, K. Yamamoto, M. Ishii et al., Vapour-phase oxidation of diamond surfaces in O2 studied by diffuse reflectance fourier-transform infrared and temperature-programmed desorption spectroscopy. J. Chem. Soc., Faraday Trans. 89(19), 3635–3640 (1993). https://doi.org/10.1039/FT9938903635
A. Tallaire, T. Ouisse, A. Lantreibecq et al., Identification of dislocations in synthetic chemically vapor deposited diamond single crystals. Cryst. Growth Des. 16(5), 2741–2746 (2016). https://doi.org/10.1021/acs.cgd.6b00053
D.Y. Liu, L.C. Hao, W.K. Zhao et al., Effect of oxygen on regulation of properties of moderately boron-doped diamond films. Chin. Phys. B 31(12), 128104 (2022). https://doi.org/10.1088/1674-1056/ac8e96
S.K. Karna, D.V. Martyshkin, Y.K. Vohra et al., Synthesis and characterization of boron-doped single crystal diamond. MRS Online Proc. Libr. 1519, 1–6 (2013). https://doi.org/10.1557/opl.2012.1759
V.D. Blank, V.N. Denisov, A.N. Kirichenko et al., Raman scattering by defect-induced excitations in boron-doped diamond single crystals. Diam. Relat. Mater. 17(11), 1840–1843 (2008). https://doi.org/10.1016/j.diamond.2008.07.004
F. Pruvost, A. Deneuville, Analysis of the Fano in diamond. Diam. Relat. Mater. 10(3–7), 531–535 (2001). https://doi.org/10.1016/S0925-9635(00)00378-2
H. Li, T. Zhang, L. Li et al., Investigation on crystalline structure, boron distribution, and residual stresses in freestanding boron-doped CVD diamond films. J. Cryst. Growth 312(12–13), 1986–1991 (2010). https://doi.org/10.1016/j.jcrysgro.2010.03.020
Q.H. Fan, A. Fernandes, E. Pereira et al., Stress-relief behavior in chemical-vapor-deposited diamond films. J. Appl. Phys. 84(6), 3155–3158 (1998). https://doi.org/10.1063/1.368512
K. Ichikawa, T. Shimaoka, Y. Kato et al., Dislocations in chemical vapor deposition diamond layer detected by confocal Raman imaging. J. Appl. Phys. (2020). https://doi.org/10.1063/5.0021076
X.J. Hu, Y.G. Shen, X.P. Hao et al., The structural properties of B-O codoped diamond films. Diam. Relat. Mater. 18(2–3), 210–212 (2009). https://doi.org/10.1016/j.diamond.2008.07.009
M. Hetzl, J. Wierzbowski, T. Hoffmann et al., GaN nanowire arrays for efficient optical read-out and optoelectronic control of NV centers in diamond. Nano Lett. 18(6), 3651–3660 (2018). https://doi.org/10.1021/acs.nanolett.8b00763
X. Liu, X. Chen, H.A. Ma et al., Ultrahard stitching of nanotwinned diamond and cubic boron nitride in C2-BN composite. Sci. Rep. 6(1), 30518 (2016). https://doi.org/10.1038/srep30518
L. Ci, L. Song, C. Jin et al., Atomic layers of hybridized boron nitride and graphene domains. Nat. Mater. 9(5), 430–435 (2010). https://doi.org/10.1038/nmat2711
G. Zhao, L. Jiang, Y. He et al., Sulfonated graphene for persistent aromatic pollutant management. Adv. Mater. 23(34), 3959–3963 (2011). https://doi.org/10.1002/adma.201101007
Z. Zhou, Z. Zhang, H. Peng et al., Nitrogen-and oxygen-containing activated carbon nanotubes with improved capacitive properties. RSC Adv. 4(11), 5524–5530 (2014). https://doi.org/10.1039/C3RA45076G
X. Liu, X. Chen, D.J. Singh et al., Boron–oxygen complex yields n-type surface layer in semiconducting diamond[J]. Proc. Natl. Acad. Sci. 116(16), 7703–7711 (2019). https://doi.org/10.1073/pnas.1821612116
S. Kunuku, M. Ficek, A. Wieloszynska et al., Influence of B/N co-doping on electrical and photoluminescence properties of CVD grown homoepitaxial diamond films. Nanotechnology 33(12), 125603 (2021). https://doi.org/10.1088/1361-6528/ac4130
Acknowledgments
This work was supported by the National Natural Science Foundation of China (Grant Nos. 62274084, 61974059) and the Fundamental Research Funds for the Central Universities (0210-14380193).
Author information
Authors and Affiliations
Contributions
GYZ: Investigation, methodology, writing—original draft. KT: Conceptualization, writing—review & editing, funding acquisition. YT: Investigation; formal analysis. WKZ: Investigation. KY: Investigation. SMZ: Investigation, formal analysis. SLG: Supervision, funding acquisition.
Corresponding authors
Ethics declarations
Conflict of interest
The authors declare that there is no conflict of interest.
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
About this article
Cite this article
Zhao, G., Tang, K., Teng, Y. et al. The regulation effect of trace amount of oxygen on the properties of p-type boron-doped diamond. Journal of Materials Research 39, 1313–1323 (2024). https://doi.org/10.1557/s43578-024-01312-w
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/s43578-024-01312-w