Abstract
In this study, direct, single-step growth of bandgap-tunable magnesium-doped hexagonal boron nitride (hBN) films on silicon (100) substrates via in situ doping by low-pressure chemical vapor deposition is accomplished. Magnesium nitride is used as the magnesium source, and ammonia borane was used as a single-source precursor for boron and nitrogen for the CVD growth of Mg-doped hBN films. The grown films are analyzed by X-ray photoelectron spectroscopy, and the bandgap analysis of the Mg-doped hBN films is established for the first time by UV–vis spectroscopy. X-ray fluorescence spectroscopy is applied for the first time for qualitative and semi-quantitative analysis of the grown films. It is found that Mg is successfully incorporated into the hBN films, and Mg-doped hBN films with tunable bandgap are grown by controlling the Mg concentration in the grown films.
Graphical abstract
Kubelka-Munk function vs. Wavelength of Mg-doped hBN films
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The datasets generated and analyzed during the current study are available from the corresponding author on reasonable request.
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Acknowledgments
The authors want to thank the core lab facilities located at the Helmerich Research Center, School of Materials Science and Engineering, Oklahoma State University, for the use of the scanning electron microscope and for X-ray fluorescence (XRF) spectrometer. The authors also thank Rohit Bukka for assistance in XRF data collection.
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Singhal, R., Echeverria, E., McIlroy, D.N. et al. Chemical vapor deposition growth of magnesium-doped hexagonal boron nitride films via in situ doping. Journal of Materials Research 37, 2369–2377 (2022). https://doi.org/10.1557/s43578-022-00658-3
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DOI: https://doi.org/10.1557/s43578-022-00658-3