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Effect of Low-Energy Ion-Plasma Treatment on Residual Stresses in Thin Chromium Films

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Abstract

The results of studying the effect of low-energy argon ion bombardment (~30 eV) on residual mechanical stresses in a thin chromium film are presented. The change in the mean value and stress gradient as a function of the ion bombardment duration was determined by the change in the bend of test micromechanical bridges and cantilevers. A method is proposed for calculating the depth of the stress modification in a film using these structures. It has been established that the long-term ion-plasma treatment at room temperature affects stresses at a depth of more than 100 nm.

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Authors and Affiliations

  1. Institute of Physics and Technology, Yaroslavl Branch, Russian Academy of Sciences, 150007, Yaroslavl, Russia

    A. S. Babushkin, I. V. Uvarov & I. I. Amirov

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  1. A. S. Babushkin
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  2. I. V. Uvarov
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  3. I. I. Amirov
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Correspondence to A. S. Babushkin, I. V. Uvarov or I. I. Amirov.

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Translated by L. Mosina

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Babushkin, A.S., Uvarov, I.V. & Amirov, I.I. Effect of Low-Energy Ion-Plasma Treatment on Residual Stresses in Thin Chromium Films. Tech. Phys. 63, 1800–1807 (2018). https://doi.org/10.1134/S1063784218120228

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