Abstract
The effect of high-power ion-beam irradiation on thin metal (Al, Cu, Cr) films of varying (0.08–1.9 µm) thickness deposited onto dielectric sodium silicate glass and glass-ceramic substrates is investigated. The strong effect of the ion current density and film thickness on the surface morphology under irradiation is found. The features of the dispersion of a chromium thin film having high adhesion to the dielectric substrate by a high-power ion beam are examined.
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Original Russian Text © V.S. Kovivchak, T.V. Panova, R.B. Burlakov, E.V. Knyazev, 2015, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2015, No. 10, pp. 94–99.
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Kovivchak, V.S., Panova, T.V., Burlakov, R.B. et al. Dispersion of thin metal films on dielectric substrates under high-power ion-beam irradiation. J. Surf. Investig. 9, 1093–1098 (2015). https://doi.org/10.1134/S1027451015050341
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DOI: https://doi.org/10.1134/S1027451015050341