Abstract
The optical and electrical properties of silicon-doped epitaxial gallium nitride layers grown on sapphire have been studied. The studies have been performed over a wide range of silicon concentrations on each side of the Mott transition. The critical concentrations of Si atoms corresponding to the formation of an impurity band in gallium nitride (∼2.5 × 1018 cm−3) and to the overlap of the impurity band with the conduction band (∼2 × 1019 cm−3) have been refined. The maximum of the photoluminescence spectrum shifts nonmonotonically with increasing doping level. This shift is determined by two factors: (1) an increase in the exchange interaction leading to a decrease in the energy gap width and (2) a change in the radiation mechanism as the donor concentration increases. The temperature dependence of the exciton luminescence with participating optical phonons has been studied. The energies of phonon-plasmon modes in GaN: Si layers with different silicon concentrations have been measured using Raman spectroscopy.
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Original Russian Text © V.F. Agekyan, E.V. Borisov, L.E. Vorobjev, G.A. Melentyev, H. Nykänen, L. Riuttanen, A.Yu. Serov, S. Suihkonen, O. Svensk, N. G. Filisofov, V. A. Shalygin, L.A. Shelukhin, 2015, published in Fizika Tverdogo Tela, 2015, Vol. 57, No. 4, pp. 768–774.
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Agekyan, V.F., Borisov, E.V., Vorobjev, L.E. et al. Optical and electrical properties of GaN: Si-based microstructures with a wide range of doping levels. Phys. Solid State 57, 787–793 (2015). https://doi.org/10.1134/S1063783415040046
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DOI: https://doi.org/10.1134/S1063783415040046