Abstract
A method for creation of Ge/Si structures with space-arranged nanoislands by heteroepitaxy on the pre-patterned Si(001) substrates with a square grid of the etched pits is developed. The influence of depth and inter-pit spacing on the nucleation and growth of Ge(Si) nanoislands is studied. It is shown, that the nanoislands are formed either inside pits or at their periphery depending on the pit depth. It is found that the size of the nanoislands grown inside the pits goes up with the increase of the inter-pit distance from 1 to 4 μm. The pronounced photoluminescence signal related with the space-arranged arrays of quantum dots with a period of 1 μm is observed in the range of energies from 0.9 to 1.0 eV.
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ACKNOWLEDGMENTS
We are grateful to V.A. Armbrister for conducting the MBE growth of the Ge/Si structures. The part of the study concerned with the development of methods for the growth of structures was supported by the Russian Science Foundation, project no. 14-12-00931-P. The development of the technology of EBL patterning of the surface was supported by the Russian Foundation for Basic Research, project no. 16-38-00851-mol-a. Luminescence measurements were supported by the Presidium of the Russian Academy of Sciences, Program of basic research “Nanostructures: Physics, Chemistry, Biology, and Fundamentals of Technologies”.
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Translated by E.A. Smorgonskaya
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Smagina, Z.V., Zinovyev, V.A., Krivyakin, G.K. et al. Study of the Structural and Emission Properties of Ge(Si) Quantum Dots Ordered on the Si(001) Surface. Semiconductors 52, 1150–1155 (2018). https://doi.org/10.1134/S1063782618090191
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DOI: https://doi.org/10.1134/S1063782618090191