Abstract
A study was made of the dependence of the contrast value of a negative electron resist based on hydrogen-silsesquioxane (HSQ) in the process of the development of NaOH–NaCl in an aqueous alkaline-salt solution at various temperatures. When the temperature of the developer rises from 22 to 40°C the contrast increases by 45%. An increase in contrast was also found with a decrease in the developing temperature by 27% to 10°C compared with the developing temperature of 22°C. Thus, a nonmonotonic change in the contrast of the HSQ resist from the temperature of the development was established. Studies of AFM images of test structures in areas where exposure to the HSQ resist was performed demonstrate the phase contrast even in regions with zero resist thickness after development, which indicates a change in the adhesive properties of the surface.
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REFERENCES
Choi, Y.Y., Teranishi, T., and Majima, Y., Robust Pt-based nanogap electrodes with 10 nm scale ultrafine linewidth, Appl. Phys. Express, 2019, vol. 12, no. 2, pp. 025002-1–025002-17.
Rogozhin, E., Miakonkikh, A.V., Tatarintsev, A.A., and Rudenko, K.V., Fabrication and properties of SOI-based planar silicon nanowire arrays, Proc. SPIE, 2019, vol. 11022, pp. 1102222-1–1102222-6.
Popov, V.P., Ilnitskii, M.A., Zhanaev, E.D., Myakon’kich, A.V., Rudenko, K.V., and Glukhov, A.V., Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer, Semiconductors, 2016, vol. 50, pp. 632–638.
Ruffato, G., Massari, M., Capaldo, P., and Romanato, F., Holographic silicon metasurfaces for total angular momentum demultiplexing applications in telecom, Appl. Sci. (Switzerland), 2019, vol. 9, no. 11, pp. 2387-1–2387-15.
Neder, V., Ra’Di, Y., Alù, A., and Polman, A., Combined metagratings for efficient broad-angle scattering metasurface, ACS Photon., 2019, vol. 6, no. 4, pp. 1010–1017.
Lauvernier, D., Garidel, S., Legrand, C., and Vilcot, J.P., Realization of sub-micron patterns on GaAs using a HSQ etching mask, Microelectron. Eng., 2005, vol. 77, nos. 3–4, pp. 210–216.
Lin, L., Ou, Y., Jokubavicius, V., Syväjärvi, M., Liang, M., Liu, Z., Yi, X., Schuh, P., Wellmann, P., Herstrøm, B., Jensen, F., and Ou, H., An adhesive bonding approach by hydrogen silsesquioxane for silicon carbide-based led applications, Mater. Sci. Semicond. Process., 2019, vol. 91, pp. 9–12.
Yang, J.K.W. and Berggren, K.K., Using high-contrast salty development of hydrogen silsesquioxane for sub-10 nm half-pitch lithography, J. Vac. Sci. Technol. B, 2007, vol. 25, no. 6, pp. 2025–2029.
Yang, J.K.W., Cord, B., Duan, H., Berggrena, K.K., Klingfus, J., Nam, S.-W., Kim, K.-B., and Rooks, M.J., Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography, J. Vac. Sci. Technol. B, 2009, vol. 27, no. 6, pp. 2622–2627.
Miakonkikh, A.V., Orlikovskiy, N.A., Rogozhin, A.E., Tatarintsev, A.A., and Rudenko, K.V., Dependence of the resistance of the negative e-beam resist HSQ versus the dose in the RIE and wet etching processes, Russ. Microelectron., 2018, vol. 47, no. 3, pp. 157–164.
Mironov, V.L., Osnovy skaniruyushchei zondovoi mikroskopii (Fundamentals of Scanning Probe Microscopy), Nizh. Novgorod, 2004.
Tamayo, J. and García, R., Relationship between phase shift and energy dissipation in tapping-mode scanning force microscopy, Appl. Phys. Lett., 1998, vol. 73, no. 20, pp. 2926–2928.
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The study was carried out under a state task (topic no. 0066-2019-0004) of the Valiev Physicotechnical Institute, Russian Academy of Sciences, of the Ministry of Education and Science of the Russian Federation and partly with the financial support of the Russian Foundation for Basic Research (project no. 19-37-90083).
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Tatarintsev, A.A., Shishlyannikov, A.V., Rudenko, K.V. et al. The Effect of Temperature on the Development of a Contrast HSQ Electronic Resist. Russ Microelectron 49, 151–156 (2020). https://doi.org/10.1134/S1063739720030063
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DOI: https://doi.org/10.1134/S1063739720030063