Abstract
The effect of the initial composition of the Cl2 + O2 + Ar mixture on the electrical parameters of a plasma and stationary concentrations of atomic particles under an inductive rf (13.56 MHz) discharge is studied by optical emission spectroscopy. It is shown that the variation in the O2/Ar ratio at a constant Cl2 content in the plasma gas does not lead to significant perturbations of the parameters of the electron component of the plasma, while a slight change in the concentration of chlorine atoms is determined probably by the kinetics of the heterogeneous and volumetric atomic-molecular processes. In contrast, substituting Ar for Cl2 at a constant O2 content is accompanied by an increase in the efficiency of the electron impact-induced processes, which causes a noticeable increase in the concentration of oxygen atoms. Thus, the second gas mixing mode ensures wider ranges of controlling both the absolute atomic concentrations and the ratio between these values.
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Funding
This study was carried out as part of a state assignment of the Ministry of Science and Higher Education of the Russian Federation for Valiev Institute of Physics and Technology of the Russian Academy of Sciences, theme no. FFNN-2022-0017.
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Amirov, I.I., Izyumov, M.O. & Efremov, A.M. On the Effect of the Cl2 + O2 + Ar Mixture Composition on the Concentrations of Chlorine and Oxygen Atoms in a Plasma. Russ Microelectron 51, 497–504 (2022). https://doi.org/10.1134/S1063739722700135
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DOI: https://doi.org/10.1134/S1063739722700135