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On the removal of a-C:H films deposited onto Mo, Mo oxidation, and MoO x reduction in O2 and D2 discharges

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Abstract

The peculiarities inherent to a-C:H film removal, Mo oxidation in a flowing glow discharge of oxygen, and molybdenum-oxide reduction in deuterium discharge are investigated at T = 300–320 K. After carbon is removed under O2 discharge conditions, a steady-state MoO3 layer with a limiting thickness of 25–30 nm is formed on large-block molybdenum with the predominant orientation Mo(110). Oxide films are reduced in deuterium plasma at a selective sputtering yield on the order of 0.01 O atom/D+ 2 ion. If the interior Mo surfaces of a thermonuclear reactor are cleaned of hydrocarbon sediments via oxygen discharge, the working chamber must be additionally exposed to deuterium plasma for 8–10 h to remove oxygen from the generated a-MoO3 layers with the greatest possible oxygen content of 4–4.5 µg/cm2.

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Authors and Affiliations

  1. Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences, Moscow, 119071, Russia

    A. E. Gorodetsky, R. Kh. Zalavutdinov, V. L. Bukhovets, L. P. Kazansky, A. V. Markin & A. P. Zakharov

Authors
  1. A. E. Gorodetsky
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  2. R. Kh. Zalavutdinov
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  3. V. L. Bukhovets
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  4. L. P. Kazansky
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  5. A. V. Markin
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  6. A. P. Zakharov
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Corresponding author

Correspondence to A. E. Gorodetsky.

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Original Russian Text © A.E. Gorodetsky, R.Kh. Zalavutdinov, V.L. Bukhovets, L.P. Kazansky, A.V. Markin, A.P. Zakharov, 2015, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2015, No. 10, pp. 85–93.

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Gorodetsky, A.E., Zalavutdinov, R.K., Bukhovets, V.L. et al. On the removal of a-C:H films deposited onto Mo, Mo oxidation, and MoO x reduction in O2 and D2 discharges. J. Surf. Investig. 9, 1085–1092 (2015). https://doi.org/10.1134/S1027451015050286

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  • DOI: https://doi.org/10.1134/S1027451015050286

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