Abstract
Using atomic force microscopy, the evolution of the morphology of island poly(p-xylene) films formed on silicon substrates by vapor deposition polymerization at two deposition temperatures of +23 and 0°C and a fixed monomer flow is studied. The dependences of the surface coverage, the effective thickness of the island coating, and the density and average size of the polymer islands on the deposition time are investigated. Within the framework of the dynamic scaling theory, the size distribution of islands and the size distribution of their capture zones are analyzed. It is shown that the observed features of the evolution of the morphology of island poly(p-xylylene) films cannot be fully described in the framework of classical models based on diffusion-limited aggregation. However, they can be explained by the reversibility of aggregation, which is a specific feature of the polymeric nature of the island coatings being formed.
Similar content being viewed by others
REFERENCES
W. F. Beach, in Encyclopedia of Polymer Science and Technology (Wiley, New York, 2004), p. 587.
J. G. Amar, F. Family, and P. M. Lam, Phys. Rev. B: Condens. Matter Mater. Phys. 50, 8781 (1994).
J. G. Amar and F. Family, Phys. Rev. Lett. 74, 2066 (1995).
T. L. Einstein, A. Pimpinelli, and D. L. González, J. Cryst. Growth 401, 67 (2014).
T. L. Einstein, J. R. Morales-Cifuentes, D. L. Gonzalez, and A. Pimpinelli, J. Phys.: Conf. Ser. 640, 012024 (2015).
Y. Han, M. Li, and J. W. Evans, J. Chem. Phys. 145, 211911 (2016).
P. A. Mulheran and J. A. Blackman, Philos. Mag. Lett. 72, 55 (1995).
A. Winkler, Surf. Sci. 643, 124 (2016).
A. Choukourov, I. Melnichuk, I. Gordeev, O. Kylián, J. Hanuš, J. Kousal, P. Solař, L. Hanyková, J. Brus, D. Slavínská, and H. Biederman, Thin Solid Films 565, 249 (2014).
L. Tumbek, C. Gleichweit, K. Zojer, and A. Winkler, Phys. Rev. B: Condens. Matter Mater. Phys. 86, 085402 (2012).
A. Pimpinelli, L. Tumbek, and A. Winkler, J. Phys. Chem. Lett. 5, 995 (2014).
A. Venables and H. Brune, Phys. Rev. B: Condens. Matter Mater. Phys. 66, 195404 (2002).
D. Kandel, Phys. Rev. Lett. 78, 499 (1997).
Y. P. Zhao, A. R. Hopper, G. C. Wang, and T. M. Lu, Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 60, 4310 (1999).
I. J. Lee, M. Yun, S. M. Lee, and J. Y. Kim, Phys. Rev. B: Condens. Matter Mater. Phys. 78, 115427 (2008).
I. J. Lee and M. Yun, Macromolecules 43, 5450 (2010).
D. Kirkpatrick and B. Wunderlich, Makromol. Chem. 186, 2595 (1985).
W. F. Gorham, J. Polym. Sci., Part A-1: Polym. Chem. 4, 3027 (1966).
Handbook of Silicon Water Cleaning Technology. Materials Science and Process Technology, Ed. by K. A. Reinhardt and W. Kern (William Andrew, New York, 2008).
Gwyddion. www.gwyddion.net. Cited 2019.
A. A. Bukharaev, S. A. Ziganshina, and A. P. Chuklanov, Nanotechnol. Russ. 5, 364 (2010).
R. C. Gonzalez and R. E. Woods, Digital Image Processing (Prentice Hall, New Jersey, 2008).
J. J. Senkevich, S. B. Desu, and V. Simkovic, Polymer 41, 2379 (2000).
A. Gieldon, C. Czaplewski, K. Smalara, and M. Bobrowski, J. Mol. Model. 17, 2725 (2011).
S. Y. Park, J. Blackwell, S. N. Chvalun, A. A. Nikolaev, K. A. Mailyan, A. V. Pebalk, and I. E. Kardash, Polymer 41, 2937 (2000).
J. B. Fortin and T. M. Lu, Chem. Mater. 14, 1945 (2002).
J. W. Evans, P. A. Thiel, and M. C. Bartelt, Surf. Sci. Rep. 61, 1 (2006).
J. A. Blackman and P. A. Mulheran, Phys. Rev. B: Condens. Matter Mater. Phys. 54, 11681 (1996).
L. A. Errede, R. S. Gregorian, and J. M. Hoyt, J. Am. Chem. Soc. 82, 5218 (1960).
D. R. Streltsov, A. I. Buzin, P. V. Dmitryakov, P. Kamasa, D. A. Ivanov, and S. N. Chvalun, Thermochim. Acta 643, 65 (2016).
G. Berlanda, M. Campione, M. Moret, A. Sassell, and A. Borghesi, Phys. Rev. B: Condens. Matter Mater. Phys. 69, 085409 (2004).
P. R. Ribič, V. Kalihari, C. D. Frisbie, and G. Bratina, Phys. Rev. B: Condens. Matter Mater. Phys. 80, 115307 (2009).
J. Yang, T. Wang, H. Wang, F. Zhu, G. Li, and D. Yan, J. Phys. Chem. B 112, 7816 (2008).
J. Albia and M. A. Albao, J. Vac. Sci. Technol., A 33, 021404 (2015).
J. K. Zuo and J. F. Wendelken, Phys. Rev. Lett. 66, 2227 (1991).
Y. Han, E. Gaudry, T. J. Oliveira, and J. W. Evans, J. Chem. Phys. 145, 211904 (2016).
J. R. Albia and M. A. Albao, Phys. Rev. E 95, 1 (2017).
D. L. González, A. Pimpinelli, and T. L. Einstein, Phys. Rev. E 96, 23 (2017).
K. Smalara, A. Gieldon, M. Bobrowski, J. Rybicki, and C. Czaplewski, J. Phys. Chem. A 114, 4296 (2010).
ACKNOWLEDGMENTS
AFM measurements were performed on the equipment of the Probe and Electron Microscopy Resource Center of the National Research Center Kurchatov Institute.
Funding
This work was supported by the Russian Foundation for Basic Research (project nos. 18-33-00600 and 18-00-00427).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Mitko, A.S., Streltsov, D.R., Dmitryakov, P.V. et al. Evolution of Morphology in the Process of Growth of Island Poly(p-xylylene) Films Obtained by Vapor Deposition Polymerization. Polym. Sci. Ser. A 61, 555–564 (2019). https://doi.org/10.1134/S0965545X19050122
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S0965545X19050122