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An apparatus for vacuum deposition of composite TiN−Cu coatings using coupled vacuum-arc and ion-plasma processes

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Abstract

A plasma-chemical reactor with the coupling of gas-discharge processes has been developed. These processes combine arc evaporation of titanium in a nitrogen-containing plasma and ion-plasma sputtering of copper with the formation of copper vapor. Experiments were carried out on the deposition of superhard nanostructured TiN−Cu composite layers.

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Authors and Affiliations

  1. Institute of Physical Material Science, Siberian Branch, Russian Academy of Sciences, Ulan-Ude, 670047 Republic of Buryatia, Russia

    A. P. Semenov, D. B. -D. Tsyrenov & I. A. Semenova

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  1. A. P. Semenov
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  2. D. B. -D. Tsyrenov
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  3. I. A. Semenova
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Correspondence to A. P. Semenov.

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Original Russian Text © A.P. Semenov, D.B.-D. Tsyrenov, I.A. Semenova, 2017, published in Pribory i Tekhnika Eksperimenta, 2017, No. 6, pp. 119–122.

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Semenov, A.P., Tsyrenov, D.B.D. & Semenova, I.A. An apparatus for vacuum deposition of composite TiN−Cu coatings using coupled vacuum-arc and ion-plasma processes. Instrum Exp Tech 60, 892–895 (2017). https://doi.org/10.1134/S0020441217060094

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  • DOI: https://doi.org/10.1134/S0020441217060094

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