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The role of plasma technology in barrier coating deposition

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Abstract

Recently, the search of effective moisture and gas barrier coatings based on flexible plastics has been extensively explored for various applications such as food packaging, encapsulation of organic electronics, organic light-emitting diodes (OLED) and quantum dots, sealing of vacuum insulation panels, biomedical applications, renewable organic energy, and protective coatings, and so on. Several approaches have been developed to prepare the barrier layers. The employment of plasma technology in barrier layer deposition demonstrates a unique characteristic and superior advantages, which are significantly favorable in scale, quality, and cost. The high-quality barrier layer with low permeation rate is even achieved by roll-to-roll processing, including plasma technologies ranging from plasma enhanced physical vapor deposition (PEPVD), plasma-assisted/-enhanced chemical vapor deposition (PECVD/PACVD), to plasma-assisted/enhanced atomic layer deposition (PEALD/PAALD). In this paper, the preparations of barrier layers based on plasma technology are summarized as follows: the plasma source, plasma working environment, and mechanism of plasma-enhanced coating growth in PVD, PECVD, or PEALD. The purpose is to clarify the relationship of plasma technology with the preparation methods, barrier properties, and application fields, and indicate the fabrication of barrier, or even superior barrier, films in future.

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References

  • G. Abbas, S. Roy, P. Papakonstantinou, J. McLaughlin, Carbon 43, 303 (2005)

    Article  Google Scholar 

  • M. Abbasi-Firouzjah, S.-I. Hosseini, M. Shariat, B. Shokri, J. Non. Cryst. Solids 368, 86 (2013)

    Article  ADS  Google Scholar 

  • J.D. Affinito, S. Eufinger, M.E. Gross, G.L. Graff, P.M. Martin, Thin Solid Films 308, 19 (1997)

    Article  ADS  Google Scholar 

  • L. Agres, Y. Segui, R. Delsol, P. Raynaud, J. Appl. Polym. Sci. 61, 2015 (1996)

    Article  Google Scholar 

  • K. Akedo, A. Miura, K. Noda, H. Fujikawa, Mater. Res. Soc. Symp. Proc. 1030, G01-09 (2008)

    Google Scholar 

  • M.R. Alexander, F. Jones, R. Short, J. Phys. Chem. B 101, 3614 (1997)

    Article  Google Scholar 

  • M. Alexandre, P. Dubois, Mater. Sci. Eng. r: Reports 28, 1 (2000)

    Article  Google Scholar 

  • R. Amri, S. Sahel, C. Manaa, L. Bouaziz, D. Gamra, M. Lejeune, M. Clin, K. Zellama, H. Bouchriha, Superlattice. Microst. 96, 273 (2016)

    Article  ADS  Google Scholar 

  • R. Amri, S. Sahel, D. Gamra, M. Lejeune, M. Clin, K. Zellama, H. Bouchriha, Opt. Mater. 76, 222 (2018)

    Article  ADS  Google Scholar 

  • K.D. Anderson, S.L. Young, H. Jiang, R. Jakubiak, T.J. Bunning, R.R. Naik, V.V. Tsukruk, Langmuir 28, 1833 (2012)

    Article  Google Scholar 

  • Andrea Susanne Grüniger, Deposition of SiOx diffusion barriers on flexible packaging materials by plasma enhanced chemical vapor deposition, PhD thesis, Swiss Federal Institute of Technology Zurich (2004)

  • S.-H. Bang, N.-M. Hwang, H.-L. Kim, Microelectron. Eng. 166, 39 (2016)

    Article  Google Scholar 

  • N.P. Bansal, R.H. Doremus, Handbook of glass properties, 2nd edn. (Academic Press, New York, 1986), pp.64–69

    Google Scholar 

  • L. Bárdos, H. Baránková, Thin Solid Films 518, 6705 (2010)

    Article  ADS  Google Scholar 

  • R. Barni, S. Zanini, C. Riccardi, Adv. Phys. Chem. 2012, 205380 (2012)

    Article  Google Scholar 

  • S.A. Barve, S.S. Chopade, R. Kar, N. Chand, M.N. Deo, A. Biswas, N.N. Patel, G.M. Rao, D.S. Patil, S. Sinha, Diam. Relat. Mater. 71, 63 (2017)

    Article  ADS  Google Scholar 

  • V. Bellido-Gonzalez, D. Monaghan, R. Brown, B. Daniel, J. Brindley and A. Azzopardi, in 2014 57th Annual Technical Conference, pp.36–38(2014)

  • M. Benmalek, H.M. Dunlop, Surf. Coat. Technol. 76–77, 821 (1995)

    Article  Google Scholar 

  • N. Bibinov, H. Halfmann, P. Awakowicz, K. Wiesemann, Meas. Sci. Technol. 18, 1327 (2007)

    Article  ADS  Google Scholar 

  • C. Bichler, T. Kerbstadt, H. Langowski, U. Moosheimer, Surf. Coat. Technol. 97, 299 (1997a)

    Article  Google Scholar 

  • C. Bichler, H.-C. Langowski, U. Moosheimer, B. Seifert, J. Adhes. Sci. Technol. 11, 233 (1997b)

    Article  Google Scholar 

  • C. Bichler, T. Kerbstadt, H.-C. Langowski, U. Moosheimer, Surf. Coat. Technol. 112, 373 (1999)

    Article  Google Scholar 

  • Andrea Bieder, PECVD of SiOx films from oxygen and hexamethyldisiloxane in a double source reactor, PhD thesis, Swiss Federal Institute of Technology Zurich(2006)

  • H. Biederman, Imperial College Press, London UK(2004)

  • C. A. Bishop, in 2002 Soc. Vac. Coaters, 45th Annul. Tech. Conf. Proc., pp. 476–479(2002)

  • C.D. Boeira, L. Leidens, F. Cemin, E. Petry, M.M. da Costa, S. Camargo Jr., A. Michels, C. Figueroa, Thin Solid Films 645, 351 (2018)

    Article  ADS  Google Scholar 

  • H. Bordet, M. Ignat, M. Dupeux, Thin Solid Films 315, 207 (1998)

    Article  ADS  Google Scholar 

  • C. Brunon, E. Chadeau, N. Oulahal, C. Grossiord, L. Dubost, F. Simon, F. Bessueille, P. Degraeve, D. Leonard, Thin Solid Films 628, 132 (2017)

    Article  ADS  Google Scholar 

  • T. Bülow, H. Gargouri, M. Siebert, R. Rudolph, H.-H. Johannes, W. Kowalsky, Nanoscale Res. Lett. 9, 1 (2014)

    Article  Google Scholar 

  • P. Burrows, G. Graff, M. Gross, P. Martin, M. Hall, E. Mast, C. Bonham, W. Bennett, L. Michalski, M. Weaver, J. Brown, D. Fogarty, L. Sapochak, in 2000 SPIE Annual Meeting, pp.1–5 (2000)

  • P. E. Burrows, G. L. Graff, M. E. Gross, P. M. Martin, M. Hall, E. Mast, C. C. Bonham, W. D. Bennett, L. A. Michalski and M. S. Weaver, in 2001 Proc. SPIE., pp.75–76 (2001)

  • P. Carcia, R. McLean, M. Groner, A. Dameron, S. George, J. Appl. Phys. 106, 023533 (2009)

    Article  ADS  Google Scholar 

  • R. Charifou, E. Espuche, F. Gouanv´e, L. Dubost, B. Monaco, J. Membr. Sci. 500, 245 (2016)

  • H. Chatham, Surf. Coat. Technol. 78, 1 (1996)

    Article  Google Scholar 

  • Q. Chen, Y.F. Zhang, E.L. Han, Y.J. Ge, J. Vac. Sci. Technol. A 24(6), 2082 (2006a)

    Article  Google Scholar 

  • T. Chen, D. Wuu, C. Wu, C. Chiang, H. Lin, Y. Chen, R.-H. Horng, Thin Solid Films 514, 188 (2006b)

    Article  ADS  Google Scholar 

  • T.N. Chen, D.S. Wuu, C.C. Wu, C.C. Chiang, Y.P. Chen, R.H. Horng, J. Electrochem. Soc. 153, F244 (2006c)

    Article  Google Scholar 

  • Q. Chen, Y.B. Fu, H. Pang, Y.F. Zhang, G.Q. Zhang, Plasma Sci. Technol 9, 401 (2007)

    Google Scholar 

  • T.-N. Chen, D.-S. Wuu, C.-C. Wu, R.-H. Horng, H.-F. Wei, L.-Y. Jiang, H.-U. Lee, Y.-Y. Chang, Vacuum 84, 1444 (2010)

    Article  ADS  Google Scholar 

  • C.C. Chiang, D.S. Wuu, H.B. Lin, Y.P. Chen, T.N. Chen, Y.C. Lin, Surf. Coat. Technol. 200, 5843 (2006)

    Article  Google Scholar 

  • H. Chiba, K. Tokuhisa, SID 47, 1532 (2016)

    Article  Google Scholar 

  • A.B. Chwang, M.A. Rothman, S.Y. Mao, R.H. Hewitt, M.S. Weaver, J.A. Silvernail, K. Rajan, M. Hack, J.J. Brown, X. Chu, Appl. Phys. Lett 83, 413 (2003)

    Article  ADS  Google Scholar 

  • M.M. Cirino, A.R. de Souza, Encontro Nac. Pesqui. Em Educ. e Ciˆencias. 9, 125 (2010)

    Google Scholar 

  • A.M. Coclite, K.K. Gleason, J. Appl. Phys. 111, 073516 (2012)

    Article  ADS  Google Scholar 

  • C. Cornelius, M. McCord, M. Bourham, P. Hauser, J. Eng. Fibers. Fabrics 13(3), 45 (2018)

    Google Scholar 

  • M. Creatore, F. Palumbo, R. d’Agostino, P. Fayet, Surf. Coat. Technol. 142, 163 (2001)

    Article  Google Scholar 

  • M. Creatore, F. Palumbo, R. d’Agostino, Pure Appl. Chem. 74, 407 (2002)

    Article  Google Scholar 

  • M. Creatore, Y. Barrell, J. Benedikt, M. Van De Sanden, Plasma Sources Sci. Technol. 15, 421 (2006)

    Article  ADS  Google Scholar 

  • A.E. Crespi, L. Leidens, C. Aguzzoli, F. Alvarez, C. Figueroa, Vacuum 144, 243 (2017)

    Article  ADS  Google Scholar 

  • M. Cullen, M. Morshed, M. O’Sullivan, E. MacHugh, B. Duffy, M. Oubaha, J. Sol. Gel. Sci. Technol. 82, 801 (2017)

    Article  Google Scholar 

  • R. d’Agostino, Plasma deposition, treatment, and etching of polymers, 1st edn. (Academic Press Inc., San Diego, 1990), pp.35–47

    Google Scholar 

  • E. Dalibón, L. Escalada, S. Simison, C. Forsich, D. Heim, S. Brühl, Surf. Coat. Technol. 312, 101 (2017)

    Article  Google Scholar 

  • M. Deilmann, S. Theiß, P. Awakowicz, Surf. Coat. Technol. 202, 1911 (2008)

    Article  Google Scholar 

  • A. Delimi, Y. Coffinier, B. Talhi, R. Boukherroub, S. Szunerits, Electrochim. Acta 55, 8921 (2010)

    Article  Google Scholar 

  • G. Dennler, C. Lungenschmied, H. Neugebauer, N.S. Sariciftci, M. Latreche, G. Czeremuszkin, M.R. Wertheimer, Thin Solid Films 511, 349 (2006)

    Article  ADS  Google Scholar 

  • J. Deville, B. Lang, P. Raynaud, Appl. Surf. Sci. 137, 136 (1999)

    Article  ADS  Google Scholar 

  • P. Dimitrakellis, E. Gogolides, Adv. Colloid Interface Sci. 254, 1 (2018)

    Article  Google Scholar 

  • C. Directive, EEC L 349, 26 (1990)

    Google Scholar 

  • S.F. Durrant, R.P. Mota, M.A. Bica de Moraes, J. Appl. Phys. 71, 448 (1992)

    Article  ADS  Google Scholar 

  • F.M. Elam, S.A. Starostin, A.S. Meshkova, B.C. van der Velden-Schuermans, J.B. Bouwstra, M.C. van de Sanden, H.W. de Vries, Plasma Process. Polym. 14, 1600143 (2017)

    Article  Google Scholar 

  • M. Eldrup, D. Lightbody, J. Sherwood, Chem. Phys. 63, 51 (1981)

    Article  Google Scholar 

  • J.O. Enlow, H. Jiang, J.T. Grant, K. Eyink, W. Su, T.J. Bunning, Polymer 49, 4042 (2008)

    Article  Google Scholar 

  • A. Erlat, R. Spontak, R. Clarke, T. Robinson, P. Haaland, Y. Tropsha, N. Harvey, E. Vogler, J. Phys. Chem. B 103, 6047 (1999)

    Article  Google Scholar 

  • A.G. Erlat, B.-C. Wang, R.J. Spontak, Y. Tropsha, K.D. Mar, D.B. Montgomery, E.A. Vogler, J. Mater Res. 15, 704 (2000)

    Article  ADS  Google Scholar 

  • A. Erlat, M. Yan, T. Kim, M. Schaepkens, J. Liu, C. Heller, P. McConnelee, T. Feist and A. Duggal, SVC, 116 (2005)

  • P. Esena, S. Zanini, C. Riccardi, Vacuum 82, 232 (2007)

    Article  ADS  Google Scholar 

  • J. Fahlteich, M. Fahland, W. Schönberger, N. Schiller, Thin Solid Films 517, 3075 (2009)

    Article  ADS  Google Scholar 

  • M. Fang, L.Z. Yang, W.W. Lei, L.J. Sang, Z.W. Liu, Q. Chen, Int. J. Nanotechnol. 21(5), 25 (2018)

    Google Scholar 

  • F. Fei, Q. Chen, Z.W. Liu, F.P. Liu, A. Solodovnyk, Plasma Chem. & Plasma Process 32(4), 755 (2012)

    Article  Google Scholar 

  • J.T. Felts, A. Grubb, J. Vac. Sci. Technol. A 10, 1675 (1992)

    Article  Google Scholar 

  • J. Felts, in 1991 Society of Vacuum Coaters, Proc 34th Annual Tech. Conf. Proc., pp pp.99 -102 (1991)

  • J. Felts, in 1999 Society of Vacuum Coaters, Proc 34st Soc Vaccuum Coaters Annual Conf. 99, pp.44–47 (1991)

  • Y. Fermi, M. Kihel, S. Sahli, P. Raynaud, Phosphorus Sulfur Silicon Relat. Elem. 194, 978 (2019)

    Article  Google Scholar 

  • I.C. Fernandes, T.V. Hadich, M.K.M. Amorim, R.G. Turri, E.C. Rangel, J.H.D. da Silva, S.F. Durrant, MCP 214, 277 (2018)

    Google Scholar 

  • E. Finson and J. Felts, Transparent SiO2 Barrier Coatings: Conversion and Production Status, in 1994 37th Annual Technical Conference Proceedings, pp.1–878068 -13-X (1994)

  • F. Fracassi, R. D’agostino, F. Palumbo, E. Angelini, S. Grassini, F. Rosalbino, Surf. Coat. Technol. 97, 719 (1997)

    Article  Google Scholar 

  • N. Fukugami, H. Nishino, M.-A. Yanaka, K. Tomiyama, Y. Tsukahara, J. Vac. Sci. Technol. A 17, 1840 (1999)

    Article  Google Scholar 

  • K. Galić, N. Ciković, Food Technol. Biotech 41, 247 (2003)

    Google Scholar 

  • V. Garofano, R. Bérard, X. Glad, C. Joblin, K. Makasheva, L. Stafford, Plasma Process. Polym. 16, 1900044 (2019)

    Article  Google Scholar 

  • N. Gavrilov, A. Kamenetskikh, P. Trernikov, D. Emlin, A. Chukin, Y.S. Surkov, Surf. Coat. Technol. 359, 117 (2019)

    Article  Google Scholar 

  • M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Process. Polym. 15, 1700209 (2018)

    Article  Google Scholar 

  • M. Geisler, J. Kieser, E. Räuchle, R. Wilhelm, J. Vac. Sci. Technol. A 8, 908 (1990)

    Article  Google Scholar 

  • M. George, P. Morse, J. Madocks, H. Tamagaki, T. Okimoto, AIMCAL 50, 715 (2007)

    Google Scholar 

  • Ž Gosar, J. Kovač, M. Mozetič, G. Primc, A. Vesel, R. Zaplotnik, Coatings 9, 234 (2019a)

    Article  Google Scholar 

  • Ž Gosar, D. Đonlagić, S. Pevec, J. Kovač, M. Mozetič, G. Primc, A. Vesel, R. Zaplotnik, Materials 12, 3238 (2019b)

    Article  ADS  Google Scholar 

  • P. Goyal, J. Hong, F. Haddad, J.-L. Maurice, P.R.I. Cabarrocas, E. Johnson, EPJ Photovolt. 7, 70301 (2016)

    Article  ADS  Google Scholar 

  • G.L. Graff, R.E. Williford, P.E. Burrows, J. Appl. Phys. 96, 1840 (2004)

    Article  ADS  Google Scholar 

  • N. Grossiord, J.M. Kroon, R. Andriessen, P.W. Blom, Org. Electron. 13, 432 (2012)

    Article  Google Scholar 

  • A. Grüniger, P.R. von Rohr, Surf. Coat. Technol. 174, 1043 (2003)

    Article  Google Scholar 

  • A. Grüniger, P.R. von Rohr, Thin Solid Films 459, 308 (2004)

    Article  ADS  Google Scholar 

  • A. Grüniger, A. Bieder, A. Sonnenfeld, P.R. Von Rohr, U. Müller, R. Hauert, Surf. Coat. Technol. 200, 4564 (2006)

    Article  Google Scholar 

  • S. Günther, M. Fahland, J. Fahlteich, B. Meyer, S. Straach, N. Schiller, Thin Solid Films 532, 44 (2013)

    Article  ADS  Google Scholar 

  • E.L. Han, Q. Chen, Y.F. Zhang, F. Chen, Y.J. Ge, Plasma Sci. Technol 9, 480 (2007)

    Article  ADS  Google Scholar 

  • Y.C. Han, E. Kim, W. Kim, H.-G. Im, B.-S. Bae, K.C. Choi, Org. Electron 14, 1435 (2013)

    Article  Google Scholar 

  • M.S. Hedenqvist, K. Johansson, Surf. Coat. Technol. 172, 7 (2003)

    Article  Google Scholar 

  • D. Hegemann, E. Bülbül, B. Hanselmann, U. Schütz, M. Amberg, S. Gaiser, Plasma Process. Polym. 18, 2000176 (2021)

    Article  Google Scholar 

  • D. Hegemann, N. Blanchard, M. Drabik and M. Amberg, in 2015 22nd International Symposium on Plasma Chemistry, pp.17–19(2015)

  • F. Hilt, N. Gherardi, D. Duday, A. l. Berné and P. Choquet, ACS Appl Mater. Interfaces 8, 12422 (2016)

    Article  Google Scholar 

  • J.L. Hodgkinson, D.W. Sheel, H.M. Yates, M.E. Pemble, Plasma Process. Polym. 3, 597 (2006)

    Article  Google Scholar 

  • L. Hoffmann, D. Theirich, T. Hasselmann, A. Räupke, D. Schlamm, T. Riedl, J. Vac. Sci. Technol. A 34, 01A114 (2016)

    Article  Google Scholar 

  • L. Hoffmann, D. Theirich, S. Pack, F. Kocak, D. Schlamm, T. Hasselmann, H. Fahl, A. Räupke, H. Gargouri, T. Riedl, A.C.S. Appl, Mater. Interfaces 9, 4171 (2017)

    Article  Google Scholar 

  • Y. Hong, Z. He, N.S. Lennhoff, D.A. Banach, J. Kanicki, J. Electron. Mater. 33, 312 (2004)

    Article  ADS  Google Scholar 

  • D. Howells, B. Henry, J. Madocks, H. Assender, Thin Solid Films 516, 3081 (2008a)

    Article  ADS  Google Scholar 

  • D. Howells, B. Henry, Y. Leterrier, J.-A. Månson, J. Madocks, H. Assender, Surf. Coat. Technol. 202, 3529 (2008b)

    Article  Google Scholar 

  • J.E. Hwang, S.H. Kim, M.S. Choi, S.M. Cho, J.Y. Lee, Mol. Cryst. Liq. Crys. 705, 141 (2020)

    Article  Google Scholar 

  • N. Inagaki, Plasma Surface Modification and Plasma Polymerization, 1st edn. (CRC Press, Boca Raton, 1996), pp.47–113

    Google Scholar 

  • N. Inagaki, S. Tasaka, M. Makino, J. Appl. Polym. Sci. 64, 1031 (1997)

    Article  Google Scholar 

  • N. Inagaki, S. Tasaka, H., J. Appl. Polym. Sci. 71, 2091 (1999)

    Article  Google Scholar 

  • S. Iwamori, Y. Gotoh, K. Moorthi, Vacuum 68, 113 (2002)

    Article  ADS  Google Scholar 

  • M. Izu, B. Dotter, S. Ovshinsky, J. Photopolym. Sci. Tec. 8, 195 (1995)

    Article  Google Scholar 

  • E. Jamieson, A. Windle, J Mater Sci 18, 64 (1983)

    Article  ADS  Google Scholar 

  • H. Jiang, K. Eyink, J.T. Grant, J. Enlow, S. Tullis, T.J. Bunning, Chem. Vap. Deposition 14, 286 (2008)

    Article  Google Scholar 

  • J. W. Jones, US Patent 3, 442, 686(1969)

  • H. Jung, H. Jeon, H. Choi, G. Ham, S. Shin, H. Jeon, J. Appl. Phys. 115, 073502 (2014)

    Article  ADS  Google Scholar 

  • G. Kaltenpoth, W. Siebert, F. Stubhan, X. Wang, L. Luo, Surf. Coat. Technol. 161, 96 (2002)

    Article  Google Scholar 

  • F. Khelifa, S. Ershov, M.-E. Druart, Y. Habibi, D. Chicot, M.-G. Olivier, R. Snyders, P. Dubois, J. Mater. Chem. a. 3, 15977 (2015)

    Article  Google Scholar 

  • K.H. Kim, H. Kim, H.M. Koo, J.K. Kim, Y.C. Kim, B.K. Ju, J.I. Han, D.G. Moon, J. Jang, SID 34, 563 (2003a)

    Article  Google Scholar 

  • H. Kim, K.H. Kim, H.M. Koo, J.K. Kim, B.K. Ju, L.M. Do, M.H. Oh, J. Jang, SID 34, 554 (2003b)

    Article  Google Scholar 

  • T.W. Kim, M. Yan, A.G. Erlat, P.A. McConnelee, M. Pellow, J. Deluca, T.P. Feist, A.R. Duggal, M. Schaepkens, J. Vac. Sci. Technol. A 23, 971 (2005)

    Article  Google Scholar 

  • L.H. Kim, K. Kim, S. Park, Y.J. Jeong, H. Kim, D.S. Chung, S.H. Kim, C.E. Park, A.C.S. Appl, Mater. Interfaces 6, 6731 (2014)

    Article  Google Scholar 

  • K. Kim, O.N. Pierron, S. Graham, J. Appl. Phys. 125, 045301 (2019)

    Article  ADS  Google Scholar 

  • D. Kirchheim, K. Bahroun, H. Behm, M. Jaritz, F. Mitschker, P. Awakowicz, R. Dahlmann, and Ch. Hopmann, in 2015 22nd International Symposium on Plasma Chemistry, Antwerp, Belgium, pp.134–136(2015)

  • J. Klemberg-Sapieha, D. Poitras, L. Martinu, N. Yamasaki, C. Lantman, J. Vac. Sci. Technol. A 15, 985 (1997)

    Article  Google Scholar 

  • T. Kobayashi, Y. Nakano, M. Ogawa, R. Hashimoto, S. Kamikawa, Y. Itoh, J. Vac. Sci. Technol. A 24, 223 (2006)

    Article  Google Scholar 

  • W.H. Koo, S.M. Jeong, S.H. Choi, H.K. Baik, S.M. Lee, S.J. Lee, J. Phys. Chem. B 108, 18884 (2004)

    Article  Google Scholar 

  • E. Koulouri, J. Kallitsis, Polymer 39, 2373 (1998)

    Article  Google Scholar 

  • J.M. Lackner, M. Wiesinger, R. Kaindl, W. Waldhauser, D. Heim, P. Hartmann, Plasma Chem. Plasma Process. 34, 259 (2014)

    Article  Google Scholar 

  • R. Lamendola, R. d’Agostino, Pure Appl. Chem. 70, 1203 (1998)

    Article  Google Scholar 

  • C. Lasorsa, P. Morando, A. Rodrigo, Surf. Coat. Technol. 194, 42 (2005)

    Article  Google Scholar 

  • K. Lau, J. Weber, H. Bartzsch, P. Frach, Thin Solid Films 517, 3110 (2009)

    Article  ADS  Google Scholar 

  • E. Lay, D.-S. Wuu, S.-Y. Lo, R.-H. Horng, H.-F. Wei, L.-Y. Jiang, H.-U. Lee, Y.-Y. Chang, Surf. Coat. Technol. 205, 4267 (2011)

    Article  Google Scholar 

  • S.Y. Lee, S.C. Kim, Polym. Eng. Sci. 37, 463 (1997)

    Article  Google Scholar 

  • S.Y. Lee, S.C. Kim, J. Appl. Polym. Sci. 67, 2001 (1998)

    Article  Google Scholar 

  • J.C. Lee, M.H. Litt, C.E. Rogers, J. Polym. Sci. b: Polym. Phys. 36, 75 (1998)

    Article  ADS  Google Scholar 

  • O. Lefeuvre, O. Kolosov, A. Every, G.A.D. Briggs, Y. Tsukahara, Ultrasonics 38, 459 (2000)

    Article  Google Scholar 

  • W.W. Lei, X.C. Li, Q. Chen, Z.D. Wang, Plasma Sci. Technol 14, 28 (2012)

    Article  ADS  Google Scholar 

  • Y. Leterrier, Prog. Mater. Sci. 48, 1 (2003)

    Article  Google Scholar 

  • Y. Letterier, J. Polym. Sci. b: Polym. Phys. 35, 1449 (1997)

    Article  ADS  Google Scholar 

  • J. Lewis, Mater. Today 9, 38 (2006)

    Article  Google Scholar 

  • J.S. Lewis, M.S. Weaver, J. Selected Topics Quant. Electron. 10, 45 (2004)

    Article  ADS  Google Scholar 

  • X.C. Li, W.W. Lei, Q. Zhao, Q. Chen, Surf. Coat. Technol. 228, S55 (2013)

    Article  Google Scholar 

  • D. Li, S. Elisabeth, A. Granier, M. Carette, A. Goullet, J.P. Landesman, Plasma Process. Polym. 13, 918 (2016)

    Article  Google Scholar 

  • H. Li, L.Z. Yang, Z.D. Wang, Z.W. Liu, Q. Chen, Molecules 24, 780 (2019)

    Article  Google Scholar 

  • C.-H. Liang, J. Lik Hang Chau, A. I.-T. Pan, C.-C. Yang and H.-H. Shih, Proc I MechE Part L: J Materials: Design and Applications 230, 569 (2016)

  • M. A. Lieberman and A. J. Lichtenberg, Principles of plasma discharges and materials processing, 2nd edn. (John Wiley & Sons, 2005), pp.47–98

  • M.-C. Lin, Y.-J. Shi, D.-S. Wuu, L.-S. Chang, Surf. Coat. Technol. 200, 5843 (2006)

    Article  Google Scholar 

  • E.M. Liston, L. Martinu, M. Wertheimer, J. Adhes. Sci. Technol. 7, 1091 (1993)

    Article  Google Scholar 

  • E.S. Lopata, Polym. Preprints 38, 1047 (1997)

    Google Scholar 

  • R.W. Lusignea, Polym. Eng. Sci. 39, 2326 (1999)

    Article  Google Scholar 

  • W.A. MacDonald, J. Mater. Chem. 14, 4 (2004)

    Article  Google Scholar 

  • J. Madocks, J. Rewhinkle, L. Barton, Materials Science and Engineering: Mater. Sci. Eng. B 119, 268 (2005)

    Article  Google Scholar 

  • D. Magni, C. Deschenaux, C. Hollenstein, A. Creatore, P. Fayet, J. Phys. D 34, 87 (2001)

    Article  ADS  Google Scholar 

  • M. Makówka, A. Sobczyk-Guzenda, W. Pawlak, B. Wendler, M. Gazicki-Lipman, H. Szymanowski, Appl. Surf. Sci. 578, 151808 (2022)

    Article  Google Scholar 

  • S. Merli, Hochrateabscheidungvon Siliziumoxid-und Zinkoxidschichtenmittel sMikrowellen plasma-unterstützter chemischer Gasphasenabscheidungauf Polycarbonat, PhD thesis, Universität Stuttgart (2015)

  • A. Meshkova, F. Elam, S. Starostin, M. van de Sanden, H. de Vries, Surf. Coat. Technol. 339, 20 (2018)

    Article  Google Scholar 

  • K.S. Miller, J. Krochta, Trends Food Sci. Technol. 8, 228 (1997)

    Article  Google Scholar 

  • F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, J. Phys. d: Appl. Phys. 50, 235201 (2017)

    Article  ADS  Google Scholar 

  • U. Moosheimer, C. Bichler, Surf. Coat. Technol. 116, 812 (1999)

    Article  Google Scholar 

  • L.V. Mora, S. Naik, S. Paul, R. Dawson, A. Neville, R. Barker, Surf. Coat. Technol. 324, 368 (2017)

    Article  Google Scholar 

  • R. Morent, N. De Geyter, T. Jacobs, S. Van Vlierberghe, P. Dubruel, C. Leys, E. Schacht, Plasma Process. Polym. 6, S537 (2009)

    Article  Google Scholar 

  • A. Morlier, S. Cros, J.-P. Garandet, N. Alberola, Sol. Energy Mater. Sol. Cells 115, 93 (2013)

    Article  Google Scholar 

  • G. Nisato, M. Kuilder, and P. Bouten, Proc. Soc. Inform. Display Symp., Dig. Tech.Papers, 34:550 (2003)

  • M. Ohring, The materials science of thin films, 1st edn. (Academic Press, New York, 1992), pp.126–450

    Google Scholar 

  • T. Okazaki, F. Sanda, T. Endo, Polym. Bull. 39, 141 (1997)

    Article  Google Scholar 

  • B. Ozkaya, F. Mitschker, O. Ozcan, P. Awakowicz, G. Grundmeier, Plasma Process. Polym. 12, 392 (2015)

    Article  Google Scholar 

  • S.M. Park, D.J. Kim, S.I. Kim, N.-E. Lee, J. Vac. Sci. Technol. A 26, 949 (2008)

    Article  Google Scholar 

  • J.-S. Park, H. Chae, H.K. Chung, S.I. Lee, Semicond. Sci. Technol. 26, 034001 (2011)

    Article  ADS  Google Scholar 

  • K.W. Park, S. Lee, H. Lee, Y.-H. Cho, Y.C. Park, S.G. Im, S.-H.K. Park, RSC Adv. 9, 58 (2019)

    Article  ADS  Google Scholar 

  • S. Pasieczna-Patkowska, J. Ryczkowski, Ann. UMCS Chem. 65, 121 (2010)

    Google Scholar 

  • A. Patelli, S. Vezzu, L. Zottarel, E. Menin, C. Sada, A. Martucci, S. Costacurta, Plasma Process. Polym. 6, S665 (2009)

    Article  Google Scholar 

  • S. Paulussen, R. Rego, O. Goossens, D. Vangeneugden, K. Rose, J. Phys. d: Appl. Phys. 38, 568 (2005)

    Article  ADS  Google Scholar 

  • R. W. B. Pearse and A. G. Gaydon, second edn. The Identification of Molecular Spectra (John Wiley & Sons, New York, USA, 1976), pp.45–87

  • L.T. Phan, S.M. Yoon, M.-W. Moon, Polymers 9, 417 (2017)

    Article  Google Scholar 

  • H.O. Pierson, Handbook of chemical vapor deposition: principles, technology and applications, 1st edn. (William Andrew, New York, 1999), pp.421–459

    Google Scholar 

  • R. Prikryl, P. Otrisal, V. Obsel, L. Svorc, R. Karkalic, J. Buk, Nanomaterial 8, 679 (2018)

    Article  Google Scholar 

  • M. Prochazka, L. Blahova, F. Krcma, J. Phys. Conf. Ser. 768, 012013 (2016)

    Article  Google Scholar 

  • H. Pulker, Appl. Optics 18, 1969 (1979)

    Article  ADS  Google Scholar 

  • Y. Qi, Z. Xiao, T. Mantei, J. Vac. Sci. Technol. A 21, 1064 (2003)

    Article  Google Scholar 

  • L. Qi, C.M. Zhang, Q. Chen, Plasma Sci. Technol 16, 45 (2014a)

    Article  ADS  Google Scholar 

  • L. Qi, C. Zhang, Q. Chen, Thin Solid Films 7, 038 (2014b)

    Google Scholar 

  • E. Ramisch, Influence of the ion energy on generation and properties of thin barrier layers deposited in a microwave plasma process, PhD thesis, Universität Stuttgart (2011).

  • R.C. Rangel, N.C. Cruz, E.C. Rangel, Materials 13, 25 (2019)

    Article  ADS  Google Scholar 

  • R.C.C. Rangel, N.C. Cruz, E.C. Rangel, Role of the plasma activation degree on densification of organosilicon films. Materials 13, 25 (2020)

    Article  ADS  Google Scholar 

  • K. Reichelt, X. Jiang, Thin Solid Films 191, 91 (1990)

    Article  ADS  Google Scholar 

  • A. Roberts, B. Henry, A. Sutton, C. Grovenor, G. Briggs, T. Miyamoto, M. Kano, Y. Tsukahara, M. Yanaka, J. Membr. Sci. 208, 75 (2002)

    Article  Google Scholar 

  • G. Rossi, M. Nulman, J. Appl. Phys. 74, 5471 (1993)

    Article  ADS  Google Scholar 

  • J. Rotger, J.-J. Pireaux, R. Caudano, N. Thorne, H. Dunlop, M. Benmalek, J. Vac. Sci. Technol. A 13, 260 (1995)

    Article  Google Scholar 

  • S. Sánchez-Valdes, F. Orona-Villarreal, M. Lopez-Quintanilla, I. Yañez-Flores, L.R. De Valle, C. Guerrero-Salazar, Polym. Eng. Sci. 38, 150 (1998)

    Article  Google Scholar 

  • N.M. Santos, T.M. Goncalves, J. de Amorim, C.M. Freire, J.R. Bortoleto, S.F. Durrant, R.P. Ribeiro, N.C. Cruz, E.C. Rangel, Surf. Coat. Technol. 311, 127 (2017)

    Article  Google Scholar 

  • C. Scherer, in 1999 Proc. New Plastics ’99, London, pp.18–25 (1999)

  • N. Schiller, S. Straach, M. Fahland and C. Charton, in 2001 Soc. Vac. Coaters, 44th Annul. Tech. Conf. Proc., pp.184–187(2001)

  • J. Schneider, M. Walker, A. Schulz, U. Stroth, Surf. Coat. Technol. 205, S165 (2011)

    Article  Google Scholar 

  • W. Schrenk, T. Alfrey Jr., Polym. Eng. Sci. 9, 393 (1969)

    Article  Google Scholar 

  • A. Schutze, J.Y. Jeong, S.E. Babayan, J. Park, G.S. Selwyn, R.F. Hicks, IEEE Trans. Plasma Sci. 26, 1685 (1998)

    Article  ADS  Google Scholar 

  • P. Scopece, A. Viaro, R. Sulcis, I. Kulyk, A. Patelli, M. Guglielmi, Plasma Process. Polym. 6, S705 (2009)

    Article  Google Scholar 

  • D. Sekelik, E. Stepanov, S. Nazarenko, D. Schiraldi, A. Hiltner, E. Baer, J. Polym, Sci. b: Polym. Phys. 37, 847 (1999)

    Google Scholar 

  • S.-W. Seo, E. Jung, C. Lim, H. Chae, S.M. Cho, Thin Solid Films 520, 6690 (2012)

    Article  ADS  Google Scholar 

  • M. Shahpanah, S. Mehrabian, M. Abbasi-Firouzjah, B. Shokri, Surf. Coat. Technol. 358, 91 (2019)

    Article  Google Scholar 

  • D. G. Shaw and M. G. Langlois, in 1993 Proc. 7th Int. Conf. Vacuum Web Coating, New Jersey, pp.36–38(1993)

  • A. Shirakura, M. Nakaya, Y. Koga, H. Kodama, T. Hasebe, T. Suzuki, Thin Solid Films 494, 84 (2006)

    Article  ADS  Google Scholar 

  • A. Silva Sobrinho, M. Latreche, G. Czeremuszkin, J. Klemberg-Sapieha, M. Wertheimer, J. Vac. Sci. Technol. A 16, 3190 (1998)

    Article  Google Scholar 

  • S.A. da Silva, N. Schühler, J. Klemberg-Sapieha, M. Wertheimer, M. Andrews, S. Gujrathi, J. Vac. Sci. Technol. A 16, 202 (1998)

    Google Scholar 

  • S. Singamaneni, M.C. LeMieux, H.P. Lang, C. Gerber, Y. Lam, S. Zauscher, P.G. Datskos, N.V. Lavrik, H. Jiang, R.R. Naik, Adv. Mater. 20, 653 (2008)

    Article  Google Scholar 

  • B. Singh, J. Bouchet, G. Rochat, Y. Leterrier, J.-A.E. Månson, P. Fayet, Surf. Coat. Technol. 201, 7107 (2007)

    Article  Google Scholar 

  • K.S. Siow, Plasma Process. Polym. 15, 1800059 (2018)

    Article  Google Scholar 

  • Y. Song, T. Sakurai, K. Kishimoto, K. Maruta, S. Matsumoto, K. Kikuchi, Thin Solid Films 334, 92 (1998)

    Article  ADS  Google Scholar 

  • A. Sonnenfeld, A. Bieder, P. Rudolf von Rohr, Plasma Process. Polym. 3, 606 (2006)

    Article  Google Scholar 

  • J.G. Souza, M. Bertolini, R.C. Costa, J.M. Cordeiro, B.E. Nagay, A.B. De Almeida, B. Retamal-Valdes, F.H. Nociti, M. Feres, E.C. Rangel, A.C.S. Appl, Mater. Interfaces 12, 10118 (2020)

    Article  Google Scholar 

  • S.A. Starostin, M. Creatore, J.B. Bouwstra, M.C. van de Sanden, H.W. de Vries, Plasma Process. Polym. 12, 545 (2015a)

    Article  Google Scholar 

  • S. A. Starostin, A. Meshkova, F.M. Elam, M.C.M. van de Sanden, J.B. Bouwstra and H.W. de Vries, in 2015b The 22nd International Symposium on Plasma Chemistry, Antwerp, Belgium, pp.67–68(2015b)

  • S. Steves, T. Styrnoll, F. Mitschker, S. Bienholz, B. Nikita, P. Awakowicz, J. Phys. d: Appl. Phys. 46, 445201 (2013)

    Article  Google Scholar 

  • C.F. Struller, P.J. Kelly, N.J. Copeland, C.M. Liauw, J. Vac. Sci. Technol. A 30, 041502 (2012)

    Article  Google Scholar 

  • C. Struller, P. Kelly, N. Copeland, V. Tobin, H. Assender, C. Holliday, S. Read, Thin Solid Films 553, 153 (2014a)

    Article  ADS  Google Scholar 

  • C. Struller, P. Kelly, N. Copeland, Surf. Coat. Technol. 241, 130 (2014b)

    Article  Google Scholar 

  • Y.J. Sun, Y.B. Fu, Q. Chen, C.M. Zhang, L.J. Sang, Y.F. Zhang, Chin. Phys. Lett. 25, 1753 (2008)

    Article  ADS  Google Scholar 

  • S. Takahashi, M. Yoshida, M. Asano, T. Nakagawa, Polym. J. 36, 50 (2004)

    Article  Google Scholar 

  • H. Tamagaki, T. Okimoto, Y. Kurokawa and T. Segawa, in Web Coating & Handling Conference (Charleston, South Carolina, USA, 2013), pp. 14–51

  • C. Tendero, C. Tixier, P. Tristant, J. Desmaison, P. Leprince, Spectrochim. Acta Part B. At. Spectrosc. 61, 2 (2006)

    Article  Google Scholar 

  • M. Top, S. Schönfeld, J. Fahlteich, S. Bunk, T. Kühnel, S. Straach, J.T. De Hosson, Surf. Coat. Technol. 314, 155 (2017)

    Article  Google Scholar 

  • V. Torabinejad, M. Aliofkhazraei, S. Assareh, M. Allahyarzadeh, A.S. Rouhaghdam, J. Alloys Compd. 691, 841 (2017)

    Article  Google Scholar 

  • M. Troia, Realizzazionedisuperfici nanostrutturate via plasma elorocaratterizzazionetribologica, Master thesis, Universitàdegli Studi di Bari (2012).

  • C.H. Tsai, Y.S. Li, I.C. Cheng, J.Z. Chen, Plasma Process. Polym. 11, 89 (2014)

    Article  Google Scholar 

  • S. Vallon, B. Drevillon, C. Senemaud, A. Gheorghiu, V. Yakovlev, J. Electron Spectros. Relat. Phenomena 64, 849 (1993)

    Article  Google Scholar 

  • S. Vallon, A. Hofrichter, L. Guyot, B. Drévillon, J. Klemberg-Sapieha, L. Martinu, F. Poncin-Epaillard, J. Adhes. Sci. Technol. 10, 1287 (1996)

    Article  Google Scholar 

  • C.R. Vandenabeele, S. Lucas, Mater. Sci. Eng. R Rep. 139, 100521 (2020)

    Article  Google Scholar 

  • M.C. Vasudev, H. Koerner, K.M. Singh, B.P. Partlow, D.L. Kaplan, E. Gazit, T.J. Bunning, R.R. Naik, Biomacromol 15, 533 (2014)

    Article  Google Scholar 

  • H. Wakabayashi, M. Tomozawa, J. Am. Cerum. Soc. 72, 1850 (1989)

    Article  Google Scholar 

  • M. Walther, M. Heming, M. Spallek, Surf. Coat. Technol. 80, 200 (1996)

    Article  Google Scholar 

  • B.C. Wang, Y. Tropsha, D.B. Montgomery, E.A. Vogler, R.J. Spontak, J. Mater, Sci. Lett. 18, 311 (1999)

    Article  Google Scholar 

  • H. Wang, L.Z. Yang, Q. Chen, Plasma Sci. Technol 16, 37 (2014)

    Article  ADS  Google Scholar 

  • D.S. Wavhal, J. Zhang, M.L. Steen, E.R. Fisher, Plasma Process. Polym. 3, 276 (2006)

    Article  Google Scholar 

  • M. Weaver, L. Michalski, K. Rajan, M. Rothman, J. Silvernail, J.J. Brown, P.E. Burrows, G.L. Graff, M.E. Gross, P.M. Martin, Appl. Phys. Lett. 81, 2929 (2002)

    Article  ADS  Google Scholar 

  • H.Y. Wei, H.G. Guo, L.J. Sang, X.C. Li, Q. Chen, Plasma Sci. Technol. 20, 065508 (2018)

    Article  ADS  Google Scholar 

  • M. Wertheimer, M. Moisan, J. Vac. Sci. Technol. A 3, 2643 (1985)

    Article  Google Scholar 

  • R. Wolf, K. Wandel, C. Boeffel, Plasma Process. Polym. 4, S185 (2007)

    Article  Google Scholar 

  • D. Wuu, W. Lo, C. Chiang, H. Lin, L. Chang, R.-H. Horng, C. Huang, Y. Gao, Surf. Coat. Technol. 197, 253 (2005)

    Article  ADS  Google Scholar 

  • M. Yanaka, B. Henry, A. Roberts, C. Grovenor, G. Briggs, A. Sutton, T. Miyamoto, Y. Tsukahara, N. Takeda, R. Chater, Thin Solid Films 397, 176 (2001)

    Article  ADS  Google Scholar 

  • M.-R. Yang, K.-S. Chen, S.-T. Hsu, T.-Z. Wu, Surf. Coat. Technol. 123, 204 (2000)

    Article  Google Scholar 

  • L. Yang, Z.D. Wang, S.Y. Zhang, L.Z. Yang, Q. Chen, Chin. Phys. B 18(12), 5401 (2009)

    Article  ADS  Google Scholar 

  • T.C. Yang, J. Chang, C. Lin, J. Chem. Inf. Model. 53, 1689 (2019)

    Google Scholar 

  • L.H. Yin, Q. Chen, IOP Conf. Ser. Mater. Sci. Eng. 274, 012042 (2017)

    Article  Google Scholar 

  • D. Yu, Y.-Q. Yang, Z. Chen, Y. Tao, Y.F. Liu, Opt. Commun. 362, 43 (2016)

    Article  ADS  Google Scholar 

  • J. Yun, S. Lee, Y. Jeong, H.-R. Lee, J.-D. Kwon, G.-H. Lee, JJAP 48, 055503 (2009)

    ADS  Google Scholar 

  • S.-J. Yun, A. Abidov, S. Kim, J.-S. Choi, B.S. Cho, S.C. Chung, Vacuum 148, 33 (2018)

    Article  ADS  Google Scholar 

  • L. Zajíčková, V. Buršíková, D. Franta, A. Bousquet, A. Granier, A. Goullet, J. Buršík, Plasma Process. Polym. 4, S287 (2007)

    Article  Google Scholar 

  • L. Zambov, K. Weidner, V. Shamamian, R. Camilletti, U. Pernisz, M. Loboda, G. Cerny, D. Gidley, H.-G. Peng, R. Vallery, J. Vac. Sci. Technol. A 24, 1706 (2006)

    Article  Google Scholar 

  • L. Zambov, V. Shamamian, K. Weidner, M. Loboda, Chem. Vap. Depos. 17, 253 (2011)

    Article  Google Scholar 

  • S. Zanini, C. Riccardi, M. Orlandi, E. Grimoldi, Vacuum 82, 290 (2007)

    Article  ADS  Google Scholar 

  • E. Żelazowska, E. Rysiakiewicz-Pasek, M. Borczuch-Łączka, Mater. Sci.-Pol. 23, 177 (2005)

    Google Scholar 

  • J.F. Zhang, Q. Chen, Y.F. Zhang, F.P. Liu, Z.W. Liu, Thin Solid Films 517, 3850 (2009)

    Article  ADS  Google Scholar 

  • H.B. Zhang, H. Li, M. Fang, Z.D. Wang, L.J. Sang, L.Z. Yang, Q. Chen, Appl. Surf. Sci. 388, 539 (2016)

    Article  ADS  Google Scholar 

  • H.B. Zhang, L.J. Sang, Z.D. Wang, Z.W. Liu, L.Z. Yang, Q. Chen, Plasma Sci. Technol. 20, 063001 (2018)

    Article  ADS  Google Scholar 

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  1. Lab of Plasma Physics an Materials, Beijing Institute of Graphic Communication, Beijing, China

    Zhongwei Liu, Lizhen Yang, Lijun Sang, Zhengduo Wang, Haibao Zhang, Jiushan Cheng & Qiang Chen

  2. College of Science, Donghua University, Shanghai, China

    Jianjun Shi

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Liu, Z., Yang, L., Sang, L. et al. The role of plasma technology in barrier coating deposition. Rev. Mod. Plasma Phys. 6, 27 (2022). https://doi.org/10.1007/s41614-022-00087-z

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