Abstract
In this study, nanostructured titanium (Ti) thin films were prepared by direct current magnetron sputtering (diode mode) and supported discharge (triode mode) on a stainless steel substrate. The X-ray diffraction pattern shows a preferred orientation (002) plane and exhibits a hexagonal cubic structure for the film prepared at a lower working pressure (0.7 Pa). The electrical resistivity was found to be 15 µΩ-cm. The scanning electron microscopy analysis indicates that the coatings in triode mode have agglomerates with larger grains compared to the DC magnetron sputtering diode mode. The surface topography was examined by atomic force microscopy. The electrochemical studies of the Ti thin films coated at a lower working pressure (0.7 Pa) provide evidence for better corrosion resistance.
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References
Boyer RR (1996) An overview on the use of titanium in the aerospace industry. Mater Sci Eng, A 213:103–114
Cai K, Muller M, Bossert J, Rechtenbach A, Jandt KD (2005) Surface structure and composition of flat titanium thin films as a function of film thickness and evaporation rate. Appl Surf Sci 250:252–267
Chawla V, Jayaganthan R, Chawla AK, Chandra R (2008) Morphological study of magnetron sputtered Ti thin films on silicon substrate. Mater Chem Phys 111(2–3):414–418
Chawla V, Jayaganthan R, Chawla AK, Chandra R (2009) Microstructural characterizations of magnetron sputtered Ti films on glass substrate. J Mater Process Technol 209(7):3444–3451
Chen AY, Bu Y, Tang YT, Wang Y, Liu F, Xie XF, Gu JF (2015) Deposition-rate dependence of orientation growth and crystallization of Ti thin films prepared by magnetron sputtering. Thin Solid Films 574:71–77
Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM (2011) TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Appl Surf Sci 257(14):6181–6185
Fontana LC, Muzart JLR (1998) Characteristics of triode magnetron sputtering: the morphology of deposited titanium films. Surf Coat Technol 107:24–30
Golan, Axelevith (2002) Novel method of low-vacuum plasma triode sputtering. Microelectron J 33:651–657
Jeyachandran YL, Karunagaran B, Narayandass SK, Mangalaraj D, Jenkins TE, Martin PJ (2006) Properties of titanium thin films deposited by dc magnetron sputtering. Mater Sci Eng A 431(1–2):277–284
Jin Y, Wub W, Li L, Chen J, Zhang J, Zuo Y, Jun F (2009) Effect of sputtering power on surface topography of dc magnetron sputtered Ti thin films observed by AFM. Appl Surf Sci 255:4673–4679
Jung MJ, Nam KH, Shaginyan LR, Han JG (2003) Deposition of Ti thin film using the magnetron sputtering method. Thin Solid Films 435(1–2):145–149
Kavitha A, Kannan R, Reddy PS, Rajashabala S (2016) The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge. J Mater Sci: Mater Electron 27(10):10427–10434
Kavitha A, Kannan R, Gunasekhar KR, Rajashabala S (2017a) Effect of nitrogen content on physical and chemical properties of TiN thin films prepared by DC magnetron sputtering with supported discharge. J Electron Mater 46(10):5773–5780
Kavitha A, Kannan R, Rajashabala S (2017b) Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge. Mater Sci-Poland 35(1):173–180
Kersten H, Steffen H, Vender D, Wagner HE (1995) On the ion energy transfer to the substrate during titanium deposition in a hollow cathode arc discharge. Vacuum 46:305–308
Khelfaoui Y, Kerkar M, Bali A, Dalard F (2006) Electrochemical characterisation of a PVD film of titanium on AISI 316L stainless steel. Surf Coat Technol 200:4523–4529
Liu Y-l, Liu F, Wu Q, Chen A-y, Li X, Pan D (2014) Effect of bias voltage on microstructure and nanomechanical properties of Ti films. Trans Nonferrous Met Soc China 24:2870–2876
Mohan L, Durgalakshmi D, Geetha M, Narayanan TS, Asokamani R (2012) Electrophoretic deposition of nanocomposite (HAp+ TiO2) on titanium alloy for biomedical applications. Ceram Int 38(4):3435–3443
Ruder A, Itzhak D (1982) Titanium deposition onto copper substrates using the cold-plasma technique. Thin Solid Films 97(4):339–343
Sathish S, Geetha M, Pandey ND, Richard C, Asokamani R (2010) Studies on the corrosion and wear behavior of the laser nitrided biomedical titanium and its alloys. Mater Sci Eng, C 30:376–382
Savaloni H, Reissi MH, Shariati M, Player MA (2006) Nano-structural characteristics of Ti/glass and Ti/Mo films as a function of deposition rate and angle of incidence. Thin Solid Films 515:439–443
Shoesmith DW, Hardie D, Ikeda BM, Noel JJ (1997) Hydrogen absorption and lifetime performance of titanium waste containers. In: Atomic Energy of Canada Limited Report, AECL-11770, COG-97-035-I
Shoesmith DW, Ikeda BM, LeNeveu DM (1997b) Modeling the failure of nuclear waste containers. Corrosion. 53:820–829
Singh B, Surplice NA (1972) The electrical resistivity and resistance-temperature characteristics of thin titanium films. Thin Solid Films 10(2):243–253
Textor M, Sittig C, Frauchiger V, Tosatti S, Brunette DM (2001) Titanium in Medicine. Springer, Berlin, pp 172–230
Turcio-ortega D, Rodil SE, Muhl S (2008) Structural analyses of advanced materials for aerospace industry. Mater Sci (MEDŽIAGOTYRA) 14:315–318
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Kavitha, A., Gunasekhar, K.R. & Balakrishnan, T. Structural and Electrochemical Characterization of Nanostructured Titanium Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge. Iran J Sci Technol Trans Sci 43, 2665–2671 (2019). https://doi.org/10.1007/s40995-019-00723-3
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DOI: https://doi.org/10.1007/s40995-019-00723-3