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The effect of plasma etching on the surface topography of niobium superconducting radio frequency cavities

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Abstract

In this letter the evolution of the surface topography of a niobium superconducting radio frequency cavity caused by different plasma etching modes (isotropic and anisotropic) is studied by the three-dimensional level set method. The initial rough surface is generated starting from an experimental power spectral density. The time dependence of the rms roughness is analyzed and the growth exponential factors β are determined for two etching modes (isotropic and anisotropic) assuming that isotropic etching is a much more effective mechanism of smoothing. The obtained simulation results could be useful for optimizing the parameters of the etching processes needed to obtain high quality niobium surfaces for superconducting radio frequency cavities.

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Authors and Affiliations

  1. Institute of Physics, University of Belgrade, Pregrevica 118, 11080, Belgrade, Serbia

    B. Radjenović & M. Radmilović-Radjenović

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  1. B. Radjenović
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  2. M. Radmilović-Radjenović
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Correspondence to M. Radmilović-Radjenović.

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Radjenović, B., Radmilović-Radjenović, M. The effect of plasma etching on the surface topography of niobium superconducting radio frequency cavities. Electron. Mater. Lett. 10, 1039–1043 (2014). https://doi.org/10.1007/s13391-014-3362-9

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  • DOI: https://doi.org/10.1007/s13391-014-3362-9

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