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Material surface characterization using low-energy electron microscopy and photoemission electron microscopy

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Abstract

We describe a state-of-the-art surface imaging and material characterization facility recently established for advanced structural, morphological, and electronic structure characterization of material surfaces in real time with nanometre spatial resolutions. Here, we discuss the basic principles of operation as well as the technical details of the low-energy electron microscopy cum photoemission electron microscopy (LEEM–PEEM) facility, which is similar to the transmission electron microscopes. We also present some of our experimental results on various material systems along with the demonstration of the high spatial resolution imaging capabilities as well as the availability of various contrast mechanisms that can be well utilized for nanomaterials research.

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Acknowledgements

We acknowledge the encouragement and support received from different directors of SINP, Kolkata, to realize the project. This facility was funded by the Department of Atomic Energy (DAE), Government of India, under the XII-th plan CENSUP-II project (PIC No. XII-R&D- SIN-5.09-0102). SP acknowledges University Grant Commission (UGC), India, for the PhD fellowship. We also thank ELMITEC Elektronenmikroskopie GmbH for the technical support during and after the commission of the instrument.

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Correspondence to K. S. R. Menon.

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Mohanty, S.R., Paul, S. & Menon, K.S.R. Material surface characterization using low-energy electron microscopy and photoemission electron microscopy. Indian J Phys 97, 2395–2404 (2023). https://doi.org/10.1007/s12648-022-02577-9

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  • DOI: https://doi.org/10.1007/s12648-022-02577-9

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