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Single Shot Line Profile Measurement of Multi-layered Film Thicknesses

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Abstract

We propose a novel spectroscopic ellipsometry capable of measuring line profile of the film thicknesses with a single image at once. By adopting a polarization-pixelated CMOS camera and an imaging spectrometer, spatial, spectral and polarization information of the film structure can be acquired at the frame rate of the camera without any mechanical or electrical adjustments of polarizing optical components. The proposed system is beneficial not only to provide film thickness of the specimen with a single image acquisition, but also to analyze the spatial features of the film layers.

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Funding

Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, 2018R1D1A1B07040434.

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  1. Jin Sub Kim and Hyo Mi Park these authors equally contributed this work.

Authors and Affiliations

  1. Department of Photonic Engineering, Chosun University, 309, Pilmun-daero, Dong-gu, Gwangju, 61452, South Korea

    Jin Sub Kim, Hyo Mi Park & Ki-Nam Joo

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  1. Jin Sub Kim
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  2. Hyo Mi Park
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  3. Ki-Nam Joo
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Correspondence to Ki-Nam Joo.

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Kim, J.S., Park, H.M. & Joo, KN. Single Shot Line Profile Measurement of Multi-layered Film Thicknesses. Int. J. Precis. Eng. Manuf. 21, 2089–2094 (2020). https://doi.org/10.1007/s12541-020-00410-z

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  • DOI: https://doi.org/10.1007/s12541-020-00410-z

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