Abstract
Germanium-tin (GeSn) films with Sn compositions from 5% to 11% were grown on Ge-buffered Si using a reduced pressure chemical vapor deposition system with low-cost SnCl4 and GeH4 precursors. Material characterization showed that relaxed GeSn layers with thicknesses ranging from 400 nm to 1 μm were achieved. The strong photoluminescence (PL) intensity and the low defect density indicated very high material quality. In addition, temperature-dependent 10–300 K photoluminescence spectra showed that, due to strain relaxation of the material, the emission wavelength is longer than that of strained GeSn thin film samples (t < 200 nm) having the same Sn composition. At 300 K, the PL peak at 2520 nm was observed from the sample with a 1-μm-thick GeSn layer and 11% Sn composition.
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Acknowledgements
The work in UA is supported by the National Science Foundation (NSF) under (DMR-1149605), Air Force Office of Scientific Research (AFOSR) under (FA9550-14-1-0205). The authors would also like to thank Institute for Nano Science and Engineering at the University of Arkansas for material characterization.
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Al-Kabi, S., Ghetmiri, S.A., Margetis, J. et al. Study of High-Quality GeSn Alloys Grown by Chemical Vapor Deposition towards Mid-Infrared Applications. J. Electron. Mater. 45, 6251–6257 (2016). https://doi.org/10.1007/s11664-016-5028-x
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DOI: https://doi.org/10.1007/s11664-016-5028-x