Abstract
The structural properties of molecular beam epitaxially (MBE)-grown Hg1−x Cd x Te epilayers on CdZnTe (211) substrate have been investigated using high-resolution x-ray topography and rocking curves. High-resolution x-ray diffraction 2θ–θ scans of (422) reflections were utilized in calculating the out-of-plane lattice parameters of the HgCdTe layer and the CdZnTe substrate. The lattice strain of the HgCdTe layer was evaluated using the in-plane measurements of the (311) reflection. Etching seemed to improve the surface of the substrate by removing any damage caused by polishing or any post-processing. In spite of some localized line dislocations, a remarkable quality of the MBE-grown HgCdTe layer was observed. The full width at half maximum values of the HgCdTe layer and the CdZnTe substrate were determined as 43 arc-s and 16.2 arc-s, respectively.
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Acknowledgements
The authors gratefully acknowledge helpful discussions with Dr. Yuanping Chen, Dr. Brenda VanMil and Mr. Sina Simingalam from the U.S. Army Research Laboratory.
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Amarasinghe, P.M., Qadri, S.B. & Wijewarnasuriya, P.S. High Resolution X-ray Diffraction Studies of MBE-Grown HgCdTe Layers on Bulk-Grown CdZnTe Substrate. J. Electron. Mater. 44, 2762–2767 (2015). https://doi.org/10.1007/s11664-015-3695-7
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DOI: https://doi.org/10.1007/s11664-015-3695-7