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Field Emission Properties of Nano-DLC Films Prepared on Cu Substrates by Pulsed Laser Deposition

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Abstract

Nano-diamond like carbon (DLC) thin films were prepared on fused silica and Cu substrates by the pulsed-laser deposition technique with different laser intensities. Step-measurement, atomic force microscope (AFM), UV-VIS-NIR transmittance spectroscopy and Raman spectroscopy were used to characterize the films. It was shown that the deposition rate increases with the laser intensity, and the films prepared under different laser intensities show different transparency. Raman measurement showed that the content of sp3 of the Nano-DLC thin films decreases with the laser intensity. The field emission properties of the Nano-DLC thin films on Cu substrates were studied by the conventional diode method, which showed that the turn-on field increases and the current density decreases with sp3 content in the films. A lower turn-on field of 6 V/um and a higher current density of 1 uA/cm2 were obtained for Nano-DLC thin films on Cu substrate.

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Authors and Affiliations

  1. Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, CAEP, Mianyang, 621900, China

    Liping Peng  (彭丽萍), Long Fan, Xuemin Wang & Weidong Wu  (吴卫东)

  2. Institute of Applied Electronics, CAEP, Mianyang, 621900, China

    Xiangkun Li

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  1. Liping Peng  (彭丽萍)
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  2. Xiangkun Li
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  3. Long Fan
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  4. Xuemin Wang
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  5. Weidong Wu  (吴卫东)
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Correspondence to Weidong Wu  (吴卫东).

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Peng, L., Li, X., Fan, L. et al. Field Emission Properties of Nano-DLC Films Prepared on Cu Substrates by Pulsed Laser Deposition. J. Wuhan Univ. Technol.-Mat. Sci. Edit. 33, 326–330 (2018). https://doi.org/10.1007/s11595-018-1824-9

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  • DOI: https://doi.org/10.1007/s11595-018-1824-9

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