Abstract
Pulsed discharge plasma is typical oxidation technology for disposing organic compounds in aqueous solutions. When this electrical discharge plasma was applied in water, it may produce hydrogen peroxide (H2O2) without any catalyst or chemical agent. In order to increase H2O2 production by electrical discharge plasma in water, fine bubbles were introduced into the electrical discharge plasma in this experiment. Bipolar pulsed voltages were applied to cylindrical electrodes in the water while Ar or O2 bubbles were introduced, generating a pulsed discharge plasma. The introduction of the bubbles seemed to enhance the dissociation of water molecules and increased H2O2 formation, especially with O2 bubbling. Dissolved oxygen in the water contributed to H2O2 formation by pulsed discharge plasma with the bubbles, while dissociation of water molecules was the cause of H2O2 formation by pulsed discharge plasma without bubbles. More H2O2 was formed by pulsed discharge plasma with O2 bubbles, because the amount of dissolved oxygen in the water increased upon bubbling with O2.
Similar content being viewed by others
References
Bratescu MA, Takai O, Saito N (2013) J Alloy Compd 562:74–83
Hayashi Y, Wahyudiono, Machmudah S, Kanda H, Takada N, Sasaki K, Goto M (2013) Jpn J Appl Phys 52:11NE02
Kolb JF, Mohamed AAH, Price RO, Swanson RJ, Bowman A, Chiavarini RL, Stacey M, Schoenbach KH (2008) Appl Phys Lett 92:241501
Lee HW, Nam SH, Mohamed AAH, Kim GC, Lee JK (2010) Plasma Process Polym 7:274–280
Tanaka H, Mizuno M, Ishikawa K, Nakamura K, Kajiyama H, Kano K, Kikkawa F, Hori M (2011) Plasma Med 1:265–277
Takahata J, Takaki K, Satta N, Takahashi K, Fujio T, Sasaki Y (2015) Jpn J Appl Phys 54:01AG07
Traylor MJ, Pavlovich MJ, Karim S, Hait P, Sakiyama Y, Clark DS, Graves DB (2011) J Phys D Appl Phys 44:472001
Swartling P, Lindgren B (1968) J Dairy Res 35:423–428
Kawamoto K, Tsujimoto Y (2004) J Endodo 30(1):45–50
Meunier B, Sorokin A (1997) Acc Chem Res 30:470–476
Jones CW (1999) Applications of hydrogen peroxide and derivatives. RSC publishing, UK
Locke BR, Thagard SM (2012) Plasma Chem Plasma Process 32:875–917
Joshi AA, Locke BR, Arce P, Finney WC (1995) J Hazard Mater 41:3–30
Reddy PMK, Raju BR, Karuppiah J, Reddy EL, Subrahmanyam C (2013) Chem Eng J 217:41–47
Shih KY, Locke BR (2010) Plasma Chem Plasma Process 30:1–20
Shih KY, Locke BR (2009) Plasma Process Polym 6:729–740
Sun B, Sato M, Clements JS (1999) J Phys D Appl Phys 32:1908–1915
Baroch P, Anita V, Saito N, Takai O (2008) J Electrost 66:294–299
Anpilov AM, Barkhudarov EM, Bark YB, Zadiraka YV, Christofi M, Kozlov YN, Kossyi IA, Kopev VA, Silakov VP, Taktakishvilli MI, Temchin SM (2001) J Phys D Appl Phys 34:993–999
Agarwal A, Ng WJ, Liu Y (2011) Chemosphere 84:1175–1180
Takahashi M, Chiba K, Li P (2007) J Phys Chem B 111:1343–1347
Hayashi Y, Takada N, Kanda H, Goto M (2015) Plasma Source Sci Technol 24:055023
Kim HH, Teramoto Y, Hirakawa T, Negishi N, Ogata A (2013) IJEST 7:109–114
Vanraes P, Nikiforov A, Lessiak M, Leys C (2012) J Phys: Conf Ser 406:012013
Eisenberg GM (1943) Ind Eng Chem 15:5
Bruggeman P, Cunge G, Sadeghi N (2012) Plasma Sources Sci Technol 21:035019
Nakashima T, Sakai S, Yamaguchi T, Yamamoto K, Yamada C, Kiyan T, Sakugawa T, Katsuki S, Akiyama H (2007) IEEE Trans Plasma Sci 35(3):614–618
Ashkenazy J, Kipper R, Caner M (1991) Phys Rev 43(10):5568–5574
Li OL, Takeuchi N, He Z, Guo Y, Yasuoka K, Chang JS, Saito N (2012) Plasma Chem Plasma Process 32:343–358
Thagard SM, Takashima K, Mizuno A (2009) Plasma Chem Plasma Process 29:455–473
Lam FLY, Hu X (2013) Ind Eng Chem Res 52:6639–6646
Edita V, Zdenka K, Frantisek K, Ales H (2015) Open Chem 13:218–223
Ali AD, Dhia EAE, Ammar BA, Humaida AAO (2016) Environ Sci Pollut Res 23:3406–3413
Sehgal C, Sutherland RG, Verrall RE (1980) J Phys Chem 84:388–395
Akiyama H (2000) IEEE Trans Dielectr Electr Insul 7:646–653
Aoqui S, Kawasaki H, Mitsugi F, Ohshima T, Sakai E, Muramoto I, Furukawa J, Stryczewska H D (2011) ISPC-20, Pennsylvania
Wahyudiono, Machmudah S, Nagafuchi K, Sasaki M, Akiyama H, Goto M (2013) Trans Mat Res Soc Jpn 38(1):61–67
Porter D, Poplin M D, Holzer F, Finney W C, Locke B R (2007) 42nd IAS Annual Meeting, Tallahassee
Benetoli LOB, Cadorin BM, Postiglione CS, Souzaa IG, Debacher NA (2011) J Braz Chem Soc 22(9):1669–1678
Locke RR, Shih KY (2011) Plasma Sources Sci Technol 20:034006
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Hayashi, Y., Takada, N., Wahyudiono et al. Hydrogen Peroxide Formation by Electric Discharge with Fine Bubbles. Plasma Chem Plasma Process 37, 125–135 (2017). https://doi.org/10.1007/s11090-016-9767-5
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11090-016-9767-5