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Measurement of High Density Electrons Above a Helium Film on an Amorphous Metal Substrate

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Abstract

We have measured two-dimensional electron systems bound to a thin helium film supported by a metallic substrate. We report on our measurement of electron density obtained via a Kelvin probe technique. The underlying metallic substrate is an amorphous metallic alloy (TaWSi), which can support large uniform densities due to its low surface roughness and homogeneous work function. We find that this substrate is able to support high enough densities that the electrons are expected to be Fermi-degenerate.

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The datasets generated during and/or analysed during the current study are available from the corresponding author on reasonable request.

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  • 09 January 2023

    Following text is removed from the conclusion section in the xml version: “Kindly check and confirm the conflict of interest statement is correctly identified. This information is correct.”

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Acknowledgements

This material is based upon work supported by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Award Number DE-SC0020136. Support was provided, in part, through the Program in Plasma Science and Technology under DOE Contract Number DE-AC02-09CH11466.

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  1. Department of Electrical Engineering, Princeton University, Princeton, NJ, 08544, USA

    K. E. Castoria & S. A. Lyon

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  1. K. E. Castoria
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  2. S. A. Lyon
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Correspondence to K. E. Castoria.

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S.A Lyon is an officer of Eeroq Corp.

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Castoria, K.E., Lyon, S.A. Measurement of High Density Electrons Above a Helium Film on an Amorphous Metal Substrate. J Low Temp Phys 210, 441–450 (2023). https://doi.org/10.1007/s10909-022-02904-8

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