Abstract
Na0.5Bi0.5TiO3 (NBT) thin films were fabricated on the indium tin oxide/glass substrates via a chemical solution deposition method by using different precursor solutions. Results show that the precursor solution has a remarkable influence on the crystallinity, morphology, insulating and dielectric properties of NBT thin films. Especially, the NBT thin film annealed at 500 °C from the precursor solution with acetates dissolved in 2-methoxyethanol and acetic acid shows optimal electrical properties, reflected by the reduced leakage current density, the maximum tunability of 23%, a high dielectric constant of 207 and a low dielectric loss of 0.05 as well as a large figure of merit of 4.6 at 100 kHz.
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B. Meunier, L. Largeau, P. Regreny, J. Penuelas, R. Bachelet, B. Vilquin, B. Wague, G. Saint-Girons, CrystEngComm 18, 7494–7500 (2016)
K.K. Maurya, S.K. Halder, S. Sen, A. Bose, S. Bysakh, Appl. Surf. Sci. 313, 196–206 (2014)
M. Aftabuzzaman, S. Kojima, Jpn. J. Appl. Phys. 55, 07KB03 (2016)
J.-H. Koh, T.-G. Kim, Microelectron. Reliab. 46, 183–188 (2006)
J. Carter, E. Aksel, T. Iamsasri, J.S. Forrester, J. Chen, J.L. Jones, Appl. Phys. Lett. 104, 112904 (2014)
Y.C. Guo, H.Q. Fan, C.B. Long, J. Shi, L. Yang, S.H. Lei, J. Alloy. Compd. 610, 189–195 (2014)
Z. Fu, R.Q. Zhu, D. Wu, A.D. Li, J. Sol-Gel Sci. Technol. 49, 29–34 (2009)
H. Maiwa, T. Kogure, W. Sakamoto, T. Hayashi, Ferroelectrics 405, 204–210 (2010)
Y.Y. Wu, X.H. Wang, C.F. Zhong, L.T. Li, J. Am. Ceram. Soc. 94, 3877–3882 (2011)
H.T. Sui, C.H. Yang, M.S. Zhao, W.Q. Lin, C. Feng, J. Alloy. Compd. 586, 683–687 (2014)
C. Feng, C.H. Yang, H.T. Sui, F.J. Geng, Y.J. Han, Ceram. Int. 41, 4214–4217 (2015)
H.T. Sui, C.H. Yang, G.Y. Wang, C. Feng, Surf. Rev. Lett. 21, 1450064 (2014)
U. Hasenkox, S. Hoffmann, R. Waser, J. Sol-Gel Sci. Technol. 12, 67–79 (1998)
Y. Shimizu, T. Murata, J. Am. Ceram. Soc. 80, 2702–2704 (1997)
C.H. Yang, H.T. Sui, H.L. Yang, X.X. Li, Mater. Lett. 102–103, 109–111 (2013)
D.H. Bao, X.Q. Wu, L.Y. Zhang, X. Yao, Thin Solid Films 350, 30–37 (1999)
S. Musić, M. Gotić, M. Ivanda, S. Popović, A. Turković, R. Trojko, A. Sekulić, K. Furić, Mater. Sci. Eng. B 47, 33–40 (1997)
Q.X. Jia, T.M. Mccleskey, A.K. Burrell, Y. Lin, G.E. Collis, H. Wang, A.D.Q. Li, S.R. Foltyn, Nat. Mater. 3, 529–532 (2004)
Q. Yao, C.H. Yang, F.J. Geng, C. Feng, P.P. Lv, X.Z. Zhang, J. Qian, J. Mater. Sci. 27, 776–780 (2016)
D.G. Zhou, H.J. Sun, X.F. Liu, H.T. Sui, Q.H. Guo, P.D. Liu, Y. Ruan, Ceram. Int. 43, 5901–5906 (2017)
C.H. Yang, J.Q. Sun, Z.D. Yi, Y.Y. Yao, X.S. Sun, Ceram. Int. 43, 7690–7694 (2017)
G.D. Hu, S.H. Fan, C.H. Yang, W.B. Wu, Appl. Phys. Lett. 92, 192905 (2008)
X.L. Fang, B. Shen, J.W. Zhai, X. Yao, Ceram. Int. 38S, S83–S86 (2012)
C.H. Yang, G.D. Hu, W.B. Wu, H.T. Wu, F. Yang, Z.Y. Lu, L. Wang, Appl. Phys. Lett. 100, 022909 (2012)
M. Cernea, A. Ianculescu, O. Monnereau, L. Argème, V. Bley, B. Bastide, C. Logofatu, J. Mater. Sci. 39, 2755–2759 (2004)
L. Pintilie, C. Dragoi, R. Radu, A. Costinoaia, V. Stancu, I. Pintilie, Appl. Phys. Lett. 96, 012903 (2010)
X.Y. Zhang, C.H. Yang, J.C. Wang, H. Jiang, Y.L. Ding, J. Ceram. Process. Res. 13, 735–738 (2012)
M.W. Cole, W.D. Nothwang, C. Hubbard, E. Ngo, M. Ervin, J. Appl. Phys. 93, 9218–9225 (2003)
H.R. Liu, Z.L. Liu, K.L. Yao, J. Sol-Gel Sci. Technol. 41, 123–128 (2007)
L.B. Gao, S.W. Jiang, R.G. Li, B. Li, Y.R. Li, Appl. Surf. Sci. 284, 523–526 (2013)
S. Iakovlev, C.-H. Solterbeck, M. Kuhnke, M. Es-Souni, J. Appl. Phys. 97, 094901 (2005)
Y.J. Ren, X.H. Zhu, C.Y. Zhang, J.L. Zhu, J.G. Zhu, D.Q. Xiao, Ceram. Int. 40, 2489–2493 (2014)
M. Cheng, G.Q. Tan, X. Xue, A. Xia, H.J. Ren, Phys. B 407, 3360–3363 (2012)
J.B. Xu, Y. Liu, R.L. Withers, F. Brink, H. Yang, M. Wang, J. Appl. Phys. 104, 116101 (2008)
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This work was supported by the National Natural Science Foundation of China (Grant No. 51172097) and the Scientific Research Foundation of University of Jinan (XKY1505).
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Han, Y.J., Huang, S.F., Yang, C.H. et al. The microstructure, insulating and dielectric characteristics of Na0.5Bi0.5TiO3 thin films: role of precursor solution. J Mater Sci: Mater Electron 28, 18057–18063 (2017). https://doi.org/10.1007/s10854-017-7749-x
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DOI: https://doi.org/10.1007/s10854-017-7749-x