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Faradaic efficiency of porous electrodeposits: an application to β-Ni(OH)2 films

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Abstract

Electrodeposition is a common technique for coating metallic or semiconducting substrates. The growth of the layers occurs through faradaic processes in which charges are transferred across the substrate-electrolyte interface. Since more than one reaction can occur simultaneously, it is important to study the faradaic efficiency (ε) associated to the growth of the desired layers and relate it to other parameters in order to optimize the process. In this work, an indirect method to determine the faradaic efficiency of electrodeposits with porosity (p) is proposed. The method was satisfactorily applied to porous β-Ni(OH)2 films obtained by light-assisted anodic electrodeposition. These films were grown using different electrolyte concentrations (C) and temperatures (T). In this case, a direct dependence of p and ε with C and T was found.

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Data availability

The datasets generated during and/or analyzed during the current study are not publicly available due to technical or time limitations but are available from the corresponding author on reasonable request.

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Acknowledgements

The authors wish to acknowledge the Brazilian agencies CAPES, CNPQ, FINEP/CT-INFRA, and FAPESC for supporting this research. The authors thank also Dr. Daniel G. Stroppa and Dr. Enrique Carbó-Argibay from the International Iberian Nanotechnology Laboratory for supporting during the measurements.

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Authors and Affiliations

  1. Laboratório de Filmes Finos e Superfícies, Departamento de Física, Universidade Federal de Santa Catarina, Florianópolis, 88040-900, Brazil

    L. T. Quispe, I. S. Brandt & A. A. Pasa

  2. Programa de Pós-Graduação em Ciência e Engenharia de Materiais, Departamento de Engenharia Mecânica, Universidade Federal de Santa Catarina, Florianópolis, 88040-900, Brazil

    I. S. Brandt

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  1. L. T. Quispe
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Correspondence to A. A. Pasa.

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Quispe, L.T., Brandt, I.S. & Pasa, A.A. Faradaic efficiency of porous electrodeposits: an application to β-Ni(OH)2 films. J Solid State Electrochem 22, 3025–3033 (2018). https://doi.org/10.1007/s10008-018-4012-1

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