Abstract
We report microfabrication of high aspect ratio comb-drive using deep X-ray lithography at Indus-2 synchrotron radiation source. Analysis shows that the comb-drive actuator of aspect ratio 32 will produce nearly 2.5 μm displacement when 100 V DC is applied. The displacement increases as the gap between the comb finger decreases. For fabrication of comb-drive, polyimide–gold X-ray mask using UV lithography is made for the first time in India. To pattern on an 800 μm thick X-ray photoresist (PMMA) exposures are performed using our deep X-ray lithography beamline (BL-07) at Indus-2. Metallization on the selective regions of the developed X-ray photoresist with comb-drive pattern was carried out by RF sputtering. Following this the comb-drive actuator of PMMA was fabricated by one-step X-ray lithography. The comb-drive can also be used as a sensor, energy harvester, resonator and filter.
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Acknowledgments
One of the author’s R. S. acknowledges the support from Ms. Pragya Tiwari for SEM image and Mr. B. S. Thakur for assistance at BL-07. P. R. S. acknowledges the contributions made by Mr. A. P. Singh, Mr. C. Manikandan and Mr. G. S. Deshmukh in gold electroplating for polyimide-gold X-ray mask.The technical discussion with Dr. A. K. Sinha and Dr. Haranath Ghosh is greatly acknowledged by R. S. The authors are thankful to Dr. S. K. Deb for providing the necessary support at every stage of the project.
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Shukla, R., Dhamgaye, V.P., Jain, V.K. et al. Fabrication of high aspect ratio comb-drive actuator using deep X-ray lithography at Indus-2. Microsyst Technol 20, 1273–1280 (2014). https://doi.org/10.1007/s00542-014-2230-8
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DOI: https://doi.org/10.1007/s00542-014-2230-8