Abstract
[6,6]-Phenyl C61-butyric acid methyl ester (PCBM) is a good electron transport material and can be employed in optoelectronic application. To understand the effect of the amount ratio on the capacitive behaviors, the pristine ZnO, 3%, 5% and 10% amounts PCBM (low amount) added ZnO interfacial layered Al/ZnO:PCBM/p-Si heterojunction structures have been fabricated by sol–gel spin-coating method and characterized by X-ray diffraction (XRD), capacitance–voltage (C-V) and conductance-voltage (G-V) measurements for the frequency range between 10 kHz and 1 MHz. Some electrical parameters of the pristine ZnO and various PCBM added ZnO interlayered devices have been calculated from 1/C2-V (1/capacitance2-voltage) plots for various frequencies. Moreover, capacitance transient (C-t) and conductance-transient (G-t) measurements of the Al/ZnO:PCBM/p-Si devices have been performed for various light illumination intensities from 20 to 100 mW/cm2 with 20 mW/cm2 increments under light illumination which has whole spectral matching. The results revealed that PCBM amount has a great effect on capacitance and conductivity values of the Al/ZnO:PCBM/p-Si devices.
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This work was supported by Selcuk University BAP office with Project Number 19401034.
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Conceptualization, M.Y.; methodology, M.Y. and A.K.; investigation, M.Y. and A.K.; writing—original draft preparation, M.Y. and A.K.; writing—review, supervision and editing, M.Y. and A.K. All authors have read and agreed to the published version of the manuscript.
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Yıldırım, M., Kocyigit, A. Investigation photoelectric characteristics of ZnO/p-Si heterojunction structure modification with PCBM. Appl. Phys. A 128, 700 (2022). https://doi.org/10.1007/s00339-022-05842-0
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DOI: https://doi.org/10.1007/s00339-022-05842-0