Abstract
In this paper, a production-type chemical vapour deposition (CVD) is utilized to deposit fluorine doped tin oxide thin films of different thicknesses and dopant levels. Deposited films showed a preferred orientation along the (200) plane of a tetragonal structure due to the formation of halogen rich polar molecules during the process. A holistic approach studying elastic modulus and hardness of resulting films by a high-throughput atmospheric-pressure CVD process is described. The hardness values determined lie between 8 and 20 GPa. For a given load, the modulus generally increased slightly with the thickness. The average elastic recovery for the coatings was found to be between 45 and 50%. Refractive index and thickness values derived from the fitted ellipsometry data were in excellent agreement with independent calculations from transmission and reflection data.
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This work was part financed by EU Horizon 2020 grant H2020-LCE-2015-16-53296 CHEOPS Highly Efficient Photovoltaic Perovskite Solar Cells.
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Afzaal, M., Yates, H.M., Al-Ahmed, A. et al. Understanding nanomechanical and surface ellipsometry of optical F-doped SnO2 thin films by in-line APCVD. Appl. Phys. A 126, 840 (2020). https://doi.org/10.1007/s00339-020-04033-z
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DOI: https://doi.org/10.1007/s00339-020-04033-z