Abstract
In this study, photosensitive glasses in the Na2O–ZnO–Al2O3–SiO2 system with photosensitizing agents (cerium, silver, tin, antimony) and halogenides (NaF and KBr) were synthesized through a conventional melt-quenching technique. The crystallization mechanism was investigated for solely heat-treated and UV-exposed + heat-treated samples using differential thermal analysis (DTA), X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDS) and scanning electron microscopy (SEM) techniques to understand the effect of UV exposure on crystallization behavior of photosensitive glasses. Accordingly, non-isothermal DTA measurements were performed at different heating rates to determine crystallization peak, Tp, and onset, Tc, temperatures. For solely heat-treated samples, the kinetic parameters such as the Avrami constant, n, and morphology index, m, were calculated as 1 from the Ozawa method indicating surface crystallization and the value of crystallization activation energy was calculated as 944 kJ/mol using modified Kissinger method. On the contrary, bulk crystallization was found to be predominant for UV exposed + heat-treated samples revealing that UV exposure is the primary cause of bulk crystallization in photosensitive glasses.
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Acknowledgements
The authors of this study express their gratitude to Prof. Dr. Süheyla Aydın for providing her lab equipment for crystallization kinetic studies and to Asst. Prof. Dr. Miray Çelikbilek Ersundu for her critical comments and suggestions, and finally to Research Fund of the Yildiz Technical University for the financial support under the Project Numbered FBA-2017-3080.
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Kıbrıslı, O., Ersundu, A.E. The effect of UV exposure and heat treatment on crystallization behavior of photosensitive glasses. Appl. Phys. A 124, 375 (2018). https://doi.org/10.1007/s00339-018-1799-7
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DOI: https://doi.org/10.1007/s00339-018-1799-7