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Defect tracking for nanoimprint lithography using optical surface scanner and scanning electron microscope

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Abstract

Fast optical surface scanners are used in combination with high-resolution scanning electron microscopes to facilitate the identification and tracking of nanoimprint defects. We have confirmed that hard particles cause permanent template damages during imprint, resulting in repeating imprint defects. Since contaminants encountered during imprint are dominated by hard metal oxide particles capable of causing such damage, stringent pre-imprint substrate screening is a critical requirement in a manufacturing environment.

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Acknowledgments

The authors would like to thank Seagate patterned media group for their assistance in the experiments.

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Authors and Affiliations

  1. Seagate Technology, 47488 Kato Road, Fremont, CA, 94538, USA

    Zhaoning Yu, Nobuo Kurataka, Hieu Tran & Gene Gauzner

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  1. Zhaoning Yu
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  2. Nobuo Kurataka
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  3. Hieu Tran
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  4. Gene Gauzner
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Correspondence to Zhaoning Yu.

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Yu, Z., Kurataka, N., Tran, H. et al. Defect tracking for nanoimprint lithography using optical surface scanner and scanning electron microscope. Appl. Phys. A 122, 849 (2016). https://doi.org/10.1007/s00339-016-0384-1

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  • DOI: https://doi.org/10.1007/s00339-016-0384-1

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