Abstract
In this paper, we present a simulation study of analog circuit performance parameters of a dual material double-layer gate stack (high-k/SiO2) (DM-DGS) symmetric double-gate junctionless transistor (DGJLT). The characteristics are demonstrated and compared with dual material gate (DMG) DGJLT and single material (conventional) gate (SMG) DGJLT. DMG DGJLT present superior transconductance (Gm), early voltage (VEA) and intrinsic gain (GmRO) compared to SMG DGJLT. These parameters are further improved for DM-DGS DGJLT and it can be attributed to their better gate control on the channel region.
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Baruah, R.K., Paily, R.P. (2013). A Dual Material Double-Layer Gate Stack Junctionless Transistor for Enhanced Analog Performance. In: Gaur, M.S., Zwolinski, M., Laxmi, V., Boolchandani, D., Sing, V., Sing, A.D. (eds) VLSI Design and Test. Communications in Computer and Information Science, vol 382. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-42024-5_15
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DOI: https://doi.org/10.1007/978-3-642-42024-5_15
Publisher Name: Springer, Berlin, Heidelberg
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